磁控濺鍍
Overview
Works: | 10 works in 5 publications in 5 languages |
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Titles
濺鍍二氧化鈦與氮摻雜二氧化鈦薄膜之結構與光觸媒性質研究 = = Structure and photocatalysis of undoped and nitrogen-doped titanium oxide films by reactive sputtering /
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濺鍍製備硼與碳摻雜二氧化鈦薄膜的可見光光觸媒之研究 = = Sputtered films of boron- and carbon-doped titanium oxides as visible-light photocatalyst /
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銦摻雜之鉍鈦氧塊材與薄膜之研究 = = The study of the indium-containing bismuth titanate ceramics and thin films /
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組合式共濺鍍法製備氧化鈦之馬格涅利相= Combinatorial study of Co-sputtered TinO2n-1 Magneli phase /
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利用射頻磁控濺鍍製備p型氧化鋅薄膜 = = Preparation of p-type ZnO films by RF Magnetron sputtering method /
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利用磁控濺鍍BaSnO3摻雜不同比例的La在藍寶石基板上並觀察薄膜及分析顯微結構 = = Using magnetron sputtering BaSnO3 doped with different proportions of La on the sapphire substrate and observe the thin film and analyze the microstructure /
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研究以磁控濺鍍法成長含鑭摻雜之鋇錫氧薄膜以追求高平整度之退火條件 = = Study on the annealing conditions for growing La-doped BaSnO3 thin films by magnetron sputtering in pursuit of high flatness /
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成長與退火參數對濺鍍沉積二硫化鉬薄膜的影響 = = The Effects of growth parameters and post-annealing process on MoS2 thin film by magnetron sputtering /
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Subjects