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Ultra-thin film oxide gas sensor nan...
~
Dulla, Sunil.
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Ultra-thin film oxide gas sensor nano technology.
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Ultra-thin film oxide gas sensor nano technology./
作者:
Dulla, Sunil.
面頁冊數:
157 p.
附註:
Adviser: Geoffrey B. Saupe.
Contained By:
Masters Abstracts International44-06.
標題:
Chemistry, Analytical. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=1436519
ISBN:
9780542729249
Ultra-thin film oxide gas sensor nano technology.
Dulla, Sunil.
Ultra-thin film oxide gas sensor nano technology.
- 157 p.
Adviser: Geoffrey B. Saupe.
Thesis (M.S.)--The University of Texas at El Paso, 2006.
Specialized oxide films are being investigated in our lab for their gas sensing properties as nanometer films in miniaturized sensors. We have shown that metal oxides of potassium titanium niobium oxide (KTiNbO5) and potassium niobium oxide (KNb3O8) can form anionic unilamellar colloids upon exfoliation, which can be deposited as extremely thin films. In this work we have developed a new simplified electric field-induced deposition process to create monolayers of lamellar oxide material without the need for a chemical anchor layer. In the electric field-induced deposition process, two parallel metal plates, one charged positive and the other negative were used to create charged the surfaces for electrostatically induced film formation. This work has shown that when metallic gold is used as the positive plate, anionic colloidal particles from solution formed monolayer films on the gold. Results of optical and scanning electron microscopy (SEM), and surface plasmon resonance (SPR) spectroscopy studies confirm the formation of well-ordered monolayers. (Abstract shortened by UMI.)
ISBN: 9780542729249Subjects--Topical Terms:
586156
Chemistry, Analytical.
Ultra-thin film oxide gas sensor nano technology.
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Specialized oxide films are being investigated in our lab for their gas sensing properties as nanometer films in miniaturized sensors. We have shown that metal oxides of potassium titanium niobium oxide (KTiNbO5) and potassium niobium oxide (KNb3O8) can form anionic unilamellar colloids upon exfoliation, which can be deposited as extremely thin films. In this work we have developed a new simplified electric field-induced deposition process to create monolayers of lamellar oxide material without the need for a chemical anchor layer. In the electric field-induced deposition process, two parallel metal plates, one charged positive and the other negative were used to create charged the surfaces for electrostatically induced film formation. This work has shown that when metallic gold is used as the positive plate, anionic colloidal particles from solution formed monolayer films on the gold. Results of optical and scanning electron microscopy (SEM), and surface plasmon resonance (SPR) spectroscopy studies confirm the formation of well-ordered monolayers. (Abstract shortened by UMI.)
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