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Reactive Sputter Deposition

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Depla, Diederik.

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Reactive Sputter Deposition

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Reactive Sputter Deposition/ edited by Diederik Depla, Stijn Mahieu.
其他作者:	Depla, Diederik.
出版者:	Berlin, Heidelberg :Springer-Verlag Berlin Heidelberg, : 2008.,
面頁冊數:	xviii, 570 p. :ill. (some col.), digital ;25 cm.
叢書名:	Springer Series in Materials Science,
Contained By:	Springer eBooks
標題:	Cathode sputtering (Plating process) -
電子資源:	http://www.springerlink.com/openurl.asp?genre=book&isbn=978-3-540-76664-3http://www.springerlink.com/openurl.asp?genre=book&isbn=978-3-540-76664-3
ISBN:	9783540766629 (paper)

Reactive Sputter Deposition
Reactive Sputter Deposition[electronic resource] /edited by Diederik Depla, Stijn Mahieu. - Berlin, Heidelberg :Springer-Verlag Berlin Heidelberg,2008. - xviii, 570 p. :ill. (some col.), digital ;25 cm. - Springer Series in Materials Science,1090933-033X ;.

ISBN: 9783540766629 (paper)Subjects--Topical Terms:

712122
Cathode sputtering (Plating process)

Dewey Class. No.: 621.38152

Reactive Sputter Deposition
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245 0 0 $a Reactive Sputter Deposition $h [electronic resource] / $c edited by Diederik Depla, Stijn Mahieu.
260 $a Berlin, Heidelberg : $c 2008. $b Springer-Verlag Berlin Heidelberg,
300 $a xviii, 570 p. : $b ill. (some col.), digital ; $c 25 cm.
440 0 $a Springer Series in Materials Science, $x 0933-033X ; $v 109
650 $a Cathode sputtering (Plating process) $3 712122
650 $a Thin films. $3 626403
650 $a Chemistry. $3 516420
650 $a Condensed Matter. $3 890855
650 $a Industrial Chemistry/Chemical Engineering. $3 890826
650 $a Physical Chemistry. $3 890828
650 $a Surfaces and Interfaces, Thin Films. $3 892408
700 $a Depla, Diederik. $3 907074
700 $a Mahieu, Stijn. $3 907075
710 $a SpringerLink (Online service) $3 836513
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950 $a Chemistry and Materials Science (Springer-11644; ZDB-2-CMS)

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