東華大學圖書館 |

語系: 繁體中文

說明(常見問題)

回圖書館首頁

手機版館藏查詢

登入

回首頁

切換: 標籤 | MARC模式 | ISBD

Nano-Patterning by Ion Bombardment.

Mokhtarzadeh, Mahsa.

FindBook

Google Book

Amazon

博客來

Nano-Patterning by Ion Bombardment.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Nano-Patterning by Ion Bombardment./
作者:	Mokhtarzadeh, Mahsa.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 2018,
面頁冊數:	155 p.
附註:	Source: Dissertations Abstracts International, Volume: 80-09, Section: B.
Contained By:	Dissertations Abstracts International80-09B.
標題:	Nanoscience. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10931161
ISBN:	9780438886742

Nano-Patterning by Ion Bombardment.
Mokhtarzadeh, Mahsa.

Nano-Patterning by Ion Bombardment. - Ann Arbor : ProQuest Dissertations & Theses, 2018 - 155 p.

Source: Dissertations Abstracts International, Volume: 80-09, Section: B.

Thesis (Ph.D.)--Boston University, 2018.

This item must not be added to any third party search indexes.

The bombardment of surfaces by ions can lead to the spontaneous formation of nano-structures. Depending on the irradiation conditions, smoothening or roughening mechanisms can be the leading order in pattern formation which can result in the creation of dots, ripples or ultra-smoothening effects. Because ion bombardment is already ubiquitous in industrial settings, and is relatively inexpensive compared to other surface processing techniques, self-organized patterning by ion bombardment could enable a simple, economical means of inducing well-defined nanoscale structures in a variety of settings. Understanding the fundamental behavior of surfaces during ion bombardment is therefore a vital goal; however, a complete understanding of physical processes governing surface pattern formation has not been reached yet. In order to address this issue, my thesis research has utilized three primary approaches. First, I have done real-time non-coherent X-ray scattering experiments at Cornell High Energy Synchrotron Source (CHESS) for studying kinetics of structure formation of Silicon undergoing Ar+ bombardment over a range of wavenumbers 4-5 times larger than has previously been obtained. From our data, we were able to extract values of the angle-dependent thickness of the amorphous layer that forms under ion bombardment, the ion-enhanced fluidity within that film, the magnitude of the stress being generated by the ion beam, and the strength of prompt atomic displacement mechanisms. Second, to further deepen our knowledge of surface dynamics, I have performed coherent X-ray studies of Ar+ bombardment of SiO2 at the Advanced Photon Source (APS) for investigating the dynamics more profoundly than can be done with traditional time-resolved experiments. When using a focused ion beam, an inhomogeneous ripple motion was generated, this phenomenon reflected as an oscillatory behavior in the two-time and corresponding g2(t) correlation functions. By fitting the oscillations in the g2(t) correlation function, we have determined the surface ripple velocity on SiO2 driven by Ar+ sputter erosion. Finally, to support the results of coherent X-ray experiments, simulations of growth models such as linear Kuramoto-Sivashinsky (KS) and Kardar-Parisi-Zhang (KPZ) have been carried out in order to compare the simulated temporal correlation functions of the scattered intensity with those obtained from the coherent x-ray scattering experiments.

ISBN: 9780438886742Subjects--Topical Terms:

587832
Nanoscience.

Nano-Patterning by Ion Bombardment.
LDR:03583nmm a2200349 4500 001 2210552
005 20191121124237.5
008 201008s2018 ||||||||||||||||| ||eng d
020 $a 9780438886742
035 $a (MiAaPQ)AAI10931161
035 $a (MiAaPQ)bu:14152
035 $a AAI10931161
040 $a MiAaPQ $c MiAaPQ
100 1 $a Mokhtarzadeh, Mahsa. $3 3437691
245 1 0 $a Nano-Patterning by Ion Bombardment.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2018
300 $a 155 p.
500 $a Source: Dissertations Abstracts International, Volume: 80-09, Section: B.
500 $a Publisher info.: Dissertation/Thesis.
500 $a Advisor: Ludwig, Karl F.
502 $a Thesis (Ph.D.)--Boston University, 2018.
506 $a This item must not be added to any third party search indexes.
506 $a This item must not be sold to any third party vendors.
520 $a The bombardment of surfaces by ions can lead to the spontaneous formation of nano-structures. Depending on the irradiation conditions, smoothening or roughening mechanisms can be the leading order in pattern formation which can result in the creation of dots, ripples or ultra-smoothening effects. Because ion bombardment is already ubiquitous in industrial settings, and is relatively inexpensive compared to other surface processing techniques, self-organized patterning by ion bombardment could enable a simple, economical means of inducing well-defined nanoscale structures in a variety of settings. Understanding the fundamental behavior of surfaces during ion bombardment is therefore a vital goal; however, a complete understanding of physical processes governing surface pattern formation has not been reached yet. In order to address this issue, my thesis research has utilized three primary approaches. First, I have done real-time non-coherent X-ray scattering experiments at Cornell High Energy Synchrotron Source (CHESS) for studying kinetics of structure formation of Silicon undergoing Ar+ bombardment over a range of wavenumbers 4-5 times larger than has previously been obtained. From our data, we were able to extract values of the angle-dependent thickness of the amorphous layer that forms under ion bombardment, the ion-enhanced fluidity within that film, the magnitude of the stress being generated by the ion beam, and the strength of prompt atomic displacement mechanisms. Second, to further deepen our knowledge of surface dynamics, I have performed coherent X-ray studies of Ar+ bombardment of SiO2 at the Advanced Photon Source (APS) for investigating the dynamics more profoundly than can be done with traditional time-resolved experiments. When using a focused ion beam, an inhomogeneous ripple motion was generated, this phenomenon reflected as an oscillatory behavior in the two-time and corresponding g2(t) correlation functions. By fitting the oscillations in the g2(t) correlation function, we have determined the surface ripple velocity on SiO2 driven by Ar+ sputter erosion. Finally, to support the results of coherent X-ray experiments, simulations of growth models such as linear Kuramoto-Sivashinsky (KS) and Kardar-Parisi-Zhang (KPZ) have been carried out in order to compare the simulated temporal correlation functions of the scattered intensity with those obtained from the coherent x-ray scattering experiments.
590 $a School code: 0017.
650 4 $a Nanoscience. $3 587832
650 4 $a Condensed matter physics. $3 3173567
650 4 $a Materials science. $3 543314
690 $a 0565
690 $a 0611
690 $a 0794
710 2 $a Boston University. $b Physics. $3 3169425
773 0 $t Dissertations Abstracts International $g 80-09B.
790 $a 0017
791 $a Ph.D.
792 $a 2018
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10931161