奈米線穿隧場效電晶體之閘極正交疊/負交疊與源極濃度梯度之模擬 = = S...
鄭建平

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  • 奈米線穿隧場效電晶體之閘極正交疊/負交疊與源極濃度梯度之模擬 = = Simulation of gate overlap/underlap and source doping gradient of nanowire Tunnel Field-Effect Transistors /
  • Record Type: Language materials, printed : Monograph/item
    Title/Author: 奈米線穿隧場效電晶體之閘極正交疊/負交疊與源極濃度梯度之模擬 =/ 鄭建平撰
    Reminder of title: Simulation of gate overlap/underlap and source doping gradient of nanowire Tunnel Field-Effect Transistors /
    remainder title: 奈米線穿隧場效電晶體之閘極正交疊負交疊與源極濃度梯度之模擬
    Author: 鄭建平
    other author: 劉耿銘
    Published: [花蓮縣壽豐鄉] :[國立東華大學電機工程學系], : 2019,
    Description: [18],78面 :圖,表 ;30公分
    Notes: 校內電子全文開放日期 2024/08/03
    Subject: 源極濃度梯度 -
    Online resource: http://134.208.29.108/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=G0610423013.id&searchmode=basic電子全文(依作者授權而定)
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GE0182820 五樓論文區 (5F Theses & Dissertations) 03.不外借_N 本校碩士論文 T 448.6 8711.1 2019 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
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