東華大學圖書館 |

語系: 繁體中文

說明(常見問題)

回圖書館首頁

手機版館藏查詢

登入

回首頁

切換: 標籤 | MARC模式 | ISBD

Phase-Field Models for Simulating Ph...

Stewart, James A., Jr.

FindBook

Google Book

Amazon

博客來

Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films./
作者:	Stewart, James A., Jr.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 2016,
面頁冊數:	156 p.
附註:	Source: Dissertation Abstracts International, Volume: 77-09(E), Section: B.
Contained By:	Dissertation Abstracts International77-09B(E).
標題:	Materials science. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10103529
ISBN:	9781339670959

Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films.
Stewart, James A., Jr.

Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films. - Ann Arbor : ProQuest Dissertations & Theses, 2016 - 156 p.

Source: Dissertation Abstracts International, Volume: 77-09(E), Section: B.

Thesis (Ph.D.)--University of Arkansas, 2016.

The focus of this research is to develop, implement, and utilize phase-field models to study microstructure evolution in thin films during physical vapor deposition (PVD). There are four main goals to this dissertation. First, a phase-field model is developed to simulate PVD of a single-phase polycrystalline material by coupling previous modeling efforts on deposition of single-phase materials and grain evolution in polycrystalline materials. Second, a phase-field model is developed to simulate PVD of a polymorphic material by coupling previous modeling efforts on PVD of a single-phase material, evolution in multiphase materials, and phase nucleation. Third, a novel free energy functional is proposed that incorporates appropriate energetics and dynamics for simultaneous modeling of PVD and grain evolution in single-phase polycrystalline materials. Finally, these phase-field models are implemented into custom simulation codes and utilized to illustrate these models' capabilities in capturing PVD thin film growth, grain and grain boundary (GB) evolution, phase evolution and nucleation, and temperature evolution. In general, these simulations show: grain coarsening through grain rotation and GB migration such that grains tend to align with the thin film surface features and GBs migrate to locations between these features so that each surface feature has a distinct grain and orientation; the incident vapor flux rate controls the density of the thin film and the formation of surface and subsurface features; the substrate phase distribution initially acts as a template for the growing microstructure until the thin film becomes sufficiently thick; latent heat released during PVD increases the surface temperature of the thin film creating a temperature gradient within the thin film influencing phase evolution and nucleation; and temperature distributions lead to regions within the thin film that allow for multiple phases to be stable and coexist. Further, this work shows the sequential approach for coupling phase-field models, described in goals (i) and (ii) is sufficient to capture first-order features of the growth process, such as the stagnation of GBs at the valleys of the surface roughness, but to capture higher-order features, such as orientation gradients within columnar grains, the single free energy functional approach developed in goal (iii) is necessary.

ISBN: 9781339670959Subjects--Topical Terms:

543314
Materials science.

Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films.
LDR:03339nmm a2200289 4500 001 2120413
005 20170719065336.5
008 180830s2016 ||||||||||||||||| ||eng d
020 $a 9781339670959
035 $a (MiAaPQ)AAI10103529
035 $a AAI10103529
040 $a MiAaPQ $c MiAaPQ
100 1 $a Stewart, James A., Jr. $3 3282345
245 1 0 $a Phase-Field Models for Simulating Physical Vapor Deposition and Microstructure Evolution of Thin Films.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2016
300 $a 156 p.
500 $a Source: Dissertation Abstracts International, Volume: 77-09(E), Section: B.
500 $a Adviser: Douglas E. Spearot.
502 $a Thesis (Ph.D.)--University of Arkansas, 2016.
520 $a The focus of this research is to develop, implement, and utilize phase-field models to study microstructure evolution in thin films during physical vapor deposition (PVD). There are four main goals to this dissertation. First, a phase-field model is developed to simulate PVD of a single-phase polycrystalline material by coupling previous modeling efforts on deposition of single-phase materials and grain evolution in polycrystalline materials. Second, a phase-field model is developed to simulate PVD of a polymorphic material by coupling previous modeling efforts on PVD of a single-phase material, evolution in multiphase materials, and phase nucleation. Third, a novel free energy functional is proposed that incorporates appropriate energetics and dynamics for simultaneous modeling of PVD and grain evolution in single-phase polycrystalline materials. Finally, these phase-field models are implemented into custom simulation codes and utilized to illustrate these models' capabilities in capturing PVD thin film growth, grain and grain boundary (GB) evolution, phase evolution and nucleation, and temperature evolution. In general, these simulations show: grain coarsening through grain rotation and GB migration such that grains tend to align with the thin film surface features and GBs migrate to locations between these features so that each surface feature has a distinct grain and orientation; the incident vapor flux rate controls the density of the thin film and the formation of surface and subsurface features; the substrate phase distribution initially acts as a template for the growing microstructure until the thin film becomes sufficiently thick; latent heat released during PVD increases the surface temperature of the thin film creating a temperature gradient within the thin film influencing phase evolution and nucleation; and temperature distributions lead to regions within the thin film that allow for multiple phases to be stable and coexist. Further, this work shows the sequential approach for coupling phase-field models, described in goals (i) and (ii) is sufficient to capture first-order features of the growth process, such as the stagnation of GBs at the valleys of the surface roughness, but to capture higher-order features, such as orientation gradients within columnar grains, the single free energy functional approach developed in goal (iii) is necessary.
590 $a School code: 0011.
650 4 $a Materials science. $3 543314
650 4 $a Nanoscience. $3 587832
690 $a 0794
690 $a 0565
710 2 $a University of Arkansas. $b Microelectronics-Photonics. $3 2092249
773 0 $t Dissertation Abstracts International $g 77-09B(E).
790 $a 0011
791 $a Ph.D.
792 $a 2016
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10103529