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Solution-Processed Indium Oxide Base...
~
Xu, Wangying.
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Solution-Processed Indium Oxide Based Thin-Film Transistors.
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Solution-Processed Indium Oxide Based Thin-Film Transistors./
作者:
Xu, Wangying.
面頁冊數:
193 p.
附註:
Source: Dissertation Abstracts International, Volume: 77-07(E), Section: B.
Contained By:
Dissertation Abstracts International77-07B(E).
標題:
Nanotechnology. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10024925
ISBN:
9781339519487
Solution-Processed Indium Oxide Based Thin-Film Transistors.
Xu, Wangying.
Solution-Processed Indium Oxide Based Thin-Film Transistors.
- 193 p.
Source: Dissertation Abstracts International, Volume: 77-07(E), Section: B.
Thesis (Ph.D.)--The Chinese University of Hong Kong (Hong Kong), 2015.
Oxide thin-film transistors (TFTs) have attracted considerable attention over the past decade due to their high carrier mobility and excellent uniformity. However, most of these oxide TFTs are usually fabricated using costly vacuum-based techniques. Recently, the solution processes have been developed due to the possibility of low-cost and large-area fabrication. In this thesis, we have carried out a detailed and systematic study of solution-processed oxide thin films and TFTs.
ISBN: 9781339519487Subjects--Topical Terms:
526235
Nanotechnology.
Solution-Processed Indium Oxide Based Thin-Film Transistors.
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Adviser: J. B. Xu.
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Oxide thin-film transistors (TFTs) have attracted considerable attention over the past decade due to their high carrier mobility and excellent uniformity. However, most of these oxide TFTs are usually fabricated using costly vacuum-based techniques. Recently, the solution processes have been developed due to the possibility of low-cost and large-area fabrication. In this thesis, we have carried out a detailed and systematic study of solution-processed oxide thin films and TFTs.
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At first, we demonstrated a passivation method to overcome the water susceptibility of solution-processed InZnO TFTs by utilizing octadecylphosphonic acid (ODPA) self-assembled monolayers (SAMs). The unpassivated InZnO TFTs exhibited large hysteresis in their electrical characteristics due to the adsorbed water at the semiconductor surface. Formation of a SAM of ODPA on the top of InZnO removed water molecules weakly absorbed at the back channel and prevented water diffusion from the surroundings. Therefore the passivated devices exhibited significantly reduced hysteretic characteristics.
520
$a
Secondly, we developed a simple spin-coating approach for high- k dielectrics (Al2O3, ZrO2, Y 2O3 and TiO2). These materials were used as gate dielectrics for solution-processed In2O3 or InZnO TFTs. Among the high-k dielectrics, the Al2O3-based devices showed the best performance, which is attributed to the smooth dielectric/semiconductor interface and the low interface trap density besides its good insulating property.
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Thirdly, the formation and properties of Al2O3 thin films under various annealing temperatures were intensively studied, revealing that the sol-gel-derived Al2O3 thin film undergoes the decomposition of organic residuals and nitrate groups, as well as conversion of aluminum hydroxides to form aluminum oxide. Besides, the Al2O 3 film was used as gate dielectric for solution-processed oxide TFTs, resulting in high mobility and low operating voltage.
520
$a
Finally, we proposed a green route for solution-processed oxide TFTs using water as solvent. The formation and properties of the aqueous solution-based Al2O3, Ga2O3, In2O 3 and InZnO thin films were intensively investigated by a range of complementary characterization techniques. Besides, the aqueous solution-processed In 2O3/Al2O3, InZnO/Al2O 3 and In2O3/Ga2O3 TFTs under various annealing temperatures were studied in detail. Our study represents a significant step towards the development of low-cost, low-temperature, and low voltage driven green oxide electronics.
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