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Plasmonic Enhancement of the Ellipso...

O'Mullane, Samuel.

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Plasmonic Enhancement of the Ellipsometric Measurement of Thin Metal Lines.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Plasmonic Enhancement of the Ellipsometric Measurement of Thin Metal Lines./
作者:	O'Mullane, Samuel.
面頁冊數:	91 p.
附註:	Source: Dissertation Abstracts International, Volume: 77-05(E), Section: B.
Contained By:	Dissertation Abstracts International77-05B(E).
標題:	Nanoscience. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3739483
ISBN:	9781339301297

Plasmonic Enhancement of the Ellipsometric Measurement of Thin Metal Lines.
O'Mullane, Samuel.

Plasmonic Enhancement of the Ellipsometric Measurement of Thin Metal Lines. - 91 p.

Source: Dissertation Abstracts International, Volume: 77-05(E), Section: B.

Thesis (Ph.D.)--State University of New York at Albany, 2015.

In semiconductor manufacturing, defect analysis and process control are extremely important for optimal device performance and yield enhancement. One in-line tool used for quick optical characterization is the ellipsometer. Because it is nondestructive and largely automated, ellipsometers have become key tools in this process. Scatterometry based optical critical dimension (OCD) analysis is the full optical modeling of ellipsometric measurements using regression-based structures. Specifically for metallic gratings, OCD has a couple of challenges. First, the sensitivity to changes in the width of the metal lines is decreasing for smaller widths. Second, the main scatterometry spectral simulation method (rigorous coupled wave analysis, RCWA) can produce wildly inaccurate results if convergence is not maintained. The research that will follow demonstrates full convergence using RCWA and finite element method (FEM) simulations for metal gratings of this sort. Additionally, the main focus will be on design improvements to these metal gratings to boost sensitivity to their widths. The foundation of this improvement is plasmonic activity, realized for the first time in copper interconnect test structures. Both surface plasmon and localized plasmon activity will be discussed and seen in simulation spectra. The largest sensitivity improvement is due to localized plasmons which depend significantly on all feature dimensions of the metal grating. Importantly, the new cross-grating test structure design has increasing sensitivity with decreasing width. The proposed enhancement to sensitivity for these small metal lines is demonstrated through agreement between RCWA and FEM simulations. Due to considerably different methods and formulation, these simulations would only agree for physically measurable phenomena and converged spectra for each method.

ISBN: 9781339301297Subjects--Topical Terms:

587832
Nanoscience.

Plasmonic Enhancement of the Ellipsometric Measurement of Thin Metal Lines.
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