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Growth, characterization and post-pr...

Abdulagatov, Aziz Ilmutdinovich.

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Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques.

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques./
作者:	Abdulagatov, Aziz Ilmutdinovich.
面頁冊數:	335 p.
附註:	Source: Dissertation Abstracts International, Volume: 74-05(E), Section: B.
Contained By:	Dissertation Abstracts International74-05B(E).
標題:	Chemistry, Physical. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3549153
ISBN:	9781267853721

Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques.
Abdulagatov, Aziz Ilmutdinovich.

Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques. - 335 p.

Source: Dissertation Abstracts International, Volume: 74-05(E), Section: B.

Thesis (Ph.D.)--University of Colorado at Boulder, 2012.

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are advanced thin film coating techniques developed for deposition of inorganic and hybrid organic-inorganic films respectively.

ISBN: 9781267853721Subjects--Topical Terms:

560527
Chemistry, Physical.

Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques.
LDR:03405nam a2200337 4500 001 1962093
005 20140730075028.5
008 150210s2012 ||||||||||||||||| ||eng d
020 $a 9781267853721
035 $a (MiAaPQ)AAI3549153
035 $a AAI3549153
040 $a MiAaPQ $c MiAaPQ
100 1 $a Abdulagatov, Aziz Ilmutdinovich. $3 2098114
245 1 0 $a Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques.
300 $a 335 p.
500 $a Source: Dissertation Abstracts International, Volume: 74-05(E), Section: B.
500 $a Adviser: Steven M. George.
502 $a Thesis (Ph.D.)--University of Colorado at Boulder, 2012.
520 $a Atomic layer deposition (ALD) and molecular layer deposition (MLD) are advanced thin film coating techniques developed for deposition of inorganic and hybrid organic-inorganic films respectively.
520 $a Decreasing device dimensions and increasing aspect ratios in semiconductor processing has motivated developments in ALD. The beginning of this thesis will cover study of new ALD chemistry for high dielectric constant Y 2O3. In addition, the feasibility of conducting low temperature ALD of TiN and TiAlN is explored using highly reactive hydrazine as a new nitrogen source. Developments of these ALD processes are important for the electronics industry.
520 $a As the search for new materials with more advanced properties continues, attention has shifted toward exploring the synthesis of hierarchically nanostructured thin films. Such complex architectures can provide novel functions important to the development of state of the art devices for the electronics industry, catalysis, energy conversion and memory storage as a few examples. Therefore, the main focus of this thesis is on the growth, characterization, and post-processing of ALD and MLD films for fabrication of novel composite (nanostructured) thin films. Novel composite materials are created by annealing amorphous ALD oxide alloys in air and by heat treatment of hybrid organic-inorganic MLD films in inert atmosphere (pyrolysis).
520 $a The synthesis of porous TiO2 or Al2O3 supported V2O5 for enhanced surface area catalysis was achieved by the annealing of inorganic TiVxOy and AlV xOy ALD films in air. The interplay between phase separation, surface energy difference, crystallization, and melting temperature of individual oxides were studied for their control of film morphology.
520 $a In other work, a class of novel metal oxide-graphitic carbon composite thin films was produced by pyrolysis of MLD hybrid organic-inorganic films. For example, annealing in argon of titania based hybrid films enabled fabrication of thin films of intimately mixed TiO2 and nanographitized carbon. The graphitized carbon in the film was formed as a result of the removal of hydrogen by pyrolysis of the organic constituency of the MLD film. The presence of graphitic carbon allowed a 14 orders of magnitude increase in the electrical conductivity of the composite material compared fully oxidized rutile TiO 2.
590 $a School code: 0051.
650 4 $a Chemistry, Physical. $3 560527
650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Chemistry, Inorganic. $3 517253
690 $a 0494
690 $a 0794
690 $a 0488
710 2 $a University of Colorado at Boulder. $b Chemistry. $3 1019559
773 0 $t Dissertation Abstracts International $g 74-05B(E).
790 $a 0051
791 $a Ph.D.
792 $a 2012
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3549153