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Metalcone Chemistry: In pursuit of i...

Hall, Robert A.

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Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition.

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition./
作者:	Hall, Robert A.
面頁冊數:	209 p.
附註:	Source: Dissertation Abstracts International, Volume: 74-09(E), Section: B.
Contained By:	Dissertation Abstracts International74-09B(E).
標題:	Chemistry, General. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3561969
ISBN:	9781303093821

Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition.
Hall, Robert A.

Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition. - 209 p.

Source: Dissertation Abstracts International, Volume: 74-09(E), Section: B.

Thesis (Ph.D.)--University of Colorado at Boulder, 2013.

Atomic Layer Deposition (ALD) and its subset, Molecular layer deposition (MLD), is a thin film deposition technique using alternating self-limiting precursors to grow thin films on a substrates. Recent research has expanded MLD to use reactive metal alkyls/halides and organic fragments containing alcohol groups such as ethylene glycol for use in protective barriers. Unfortunately using ethylene glycol as a precursor causes film stability issues and does not provide adequate mechanical properties for projected uses. The current research looks into the investigation of using different metal alkyls and metal halides with the trifunctional precursor glycerol.

ISBN: 9781303093821Subjects--Topical Terms:

1021807
Chemistry, General.

Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition.
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245 1 0 $a Metalcone Chemistry: In pursuit of improved mechanical properties in thin film deposition.
300 $a 209 p.
500 $a Source: Dissertation Abstracts International, Volume: 74-09(E), Section: B.
500 $a Advisers: Steven M. George; Douglas L. Gin.
502 $a Thesis (Ph.D.)--University of Colorado at Boulder, 2013.
520 $a Atomic Layer Deposition (ALD) and its subset, Molecular layer deposition (MLD), is a thin film deposition technique using alternating self-limiting precursors to grow thin films on a substrates. Recent research has expanded MLD to use reactive metal alkyls/halides and organic fragments containing alcohol groups such as ethylene glycol for use in protective barriers. Unfortunately using ethylene glycol as a precursor causes film stability issues and does not provide adequate mechanical properties for projected uses. The current research looks into the investigation of using different metal alkyls and metal halides with the trifunctional precursor glycerol.
520 $a The three main films investigated were the AlGL using trimethylaluminum and glycerol, ZnGL using diethyl zinc and glycerol and TIGL using titanium (IV) chloride and glycerol. The films were investigated using quartz crystal microbalance, X-ray reflectivity, and spectroscopic ellipsometry for characterization of their film growth. All films exhibited linear growth at a range of temperatures above 130°C with AlGL, ZnGL and TiGL displaying a growth rate at 150°C of &sim;2.34A/cycle, &sim;1.29A/cycle, and &sim;2.2A/cycle respectfully. Initially film growth was investigated in situ using quartz crystal microbalance and then the growth rates confirmed ex situ using X-ray reflectivity.
520 $a Once the film growth and mechanism were investigated, the mechanical properties were investigated to determine if there was an improvement in cross-linking in the films. The mechanical properties of these MLD films were also investigated using a mechanical testing system and nanoindenter. The mechanical properties for AlGL and ZnGL showed a large improvement from 0.69% to 1.2% for their critical tensile strain compared to previous MLD films. The films also showed an increase in mechanical properties from their nanoindentation results consistent with an increase in cross-linking.
590 $a School code: 0051.
650 4 $a Chemistry, General. $3 1021807
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710 2 $a University of Colorado at Boulder. $b Chemistry. $3 1019559
773 0 $t Dissertation Abstracts International $g 74-09B(E).
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791 $a Ph.D.
792 $a 2013
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3561969