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Plasma-enhanced chemical vapor depos...

Etemadi, Peyman.

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Plasma-enhanced chemical vapor deposition of crystalline diamond films.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Plasma-enhanced chemical vapor deposition of crystalline diamond films./
作者:	Etemadi, Peyman.
面頁冊數:	86 p.
附註:	Source: Masters Abstracts International, Volume: 41-01, page: 0306.
Contained By:	Masters Abstracts International41-01.
標題:	Engineering, Metallurgy. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=MQ68787
ISBN:	0612687872

Plasma-enhanced chemical vapor deposition of crystalline diamond films.
Etemadi, Peyman.

Plasma-enhanced chemical vapor deposition of crystalline diamond films. - 86 p.

Source: Masters Abstracts International, Volume: 41-01, page: 0306.

Thesis (M.A.Sc.)--University of Toronto (Canada), 2002.

The remarkable properties of diamond including its extreme hardness, low coefficient of friction, chemical inertness, high thermal conductivity, transparency and semi-conducting properties make it attractive for a wide range uses including cutting tools, electro-optical applications, microelectronics and even biological applications. In recent years, the techniques for deposition of crystalline diamond films have progressed rapidly. For instance, the growth rate of chemical vapor deposition (CVD) films has been increased substantially while the quality of the diamond films has also improved.

ISBN: 0612687872Subjects--Topical Terms:

1023648
Engineering, Metallurgy.

Plasma-enhanced chemical vapor deposition of crystalline diamond films.
LDR:02019nmm 2200289 4500 001 1856920
005 20040723081435.5
008 130614s2002 eng d
020 $a 0612687872
035 $a (UnM)AAIMQ68787
035 $a AAIMQ68787
040 $a UnM $c UnM
100 1 $a Etemadi, Peyman. $3 1944670
245 1 0 $a Plasma-enhanced chemical vapor deposition of crystalline diamond films.
300 $a 86 p.
500 $a Source: Masters Abstracts International, Volume: 41-01, page: 0306.
500 $a Advisers: T. W. Coyle; J. Mostaghimi.
502 $a Thesis (M.A.Sc.)--University of Toronto (Canada), 2002.
520 $a The remarkable properties of diamond including its extreme hardness, low coefficient of friction, chemical inertness, high thermal conductivity, transparency and semi-conducting properties make it attractive for a wide range uses including cutting tools, electro-optical applications, microelectronics and even biological applications. In recent years, the techniques for deposition of crystalline diamond films have progressed rapidly. For instance, the growth rate of chemical vapor deposition (CVD) films has been increased substantially while the quality of the diamond films has also improved.
520 $a In this research the influence of deposition parameters on the characteristics of diamond films deposited by microwave-enhanced CVD have been investigated using a three-factor, 2 level, full factorial experimental design. The influence of substrate temperature, deposition pressure, and methane concentration on the quality of diamond films deposited on molybdenum substrates were examined. The quality of the coatings was assessed by scanning electron microscopy, Raman spectroscopy, and x-ray diffraction.
590 $a School code: 0779.
650 4 $a Engineering, Metallurgy. $3 1023648
690 $a 0743
710 2 0 $a University of Toronto (Canada). $3 1017674
773 0 $t Masters Abstracts International $g 41-01.
790 1 0 $a Coyle, T. W., $e advisor
790 1 0 $a Mostaghimi, J., $e advisor
790 $a 0779
791 $a M.A.Sc.
792 $a 2002
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=MQ68787