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Nanomechanical/nanotribological char...

Wei, Guohua.

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Nanomechanical/nanotribological characterization of thin film materials for magnetic recording.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Nanomechanical/nanotribological characterization of thin film materials for magnetic recording./
作者:	Wei, Guohua.
面頁冊數:	154 p.
附註:	Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2350.
Contained By:	Dissertation Abstracts International64-05B.
標題:	Engineering, Materials Science. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3092386

Nanomechanical/nanotribological characterization of thin film materials for magnetic recording.
Wei, Guohua.

Nanomechanical/nanotribological characterization of thin film materials for magnetic recording. - 154 p.

Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2350.

Thesis (Ph.D.)--The University of Alabama, 2003.

Magnetic recording technology must support a rapidly increasing areal data density. In order to achieve the current goal, 1 Tbit/in<super>2</super>, the nanomechanical/nanotribological characterization of the thin film materials found in the key components of the magnetic media: the underlayer, the magnetic layer, and the overcoat, needs to be investigated systematically. Accordingly, the dissertation is divided into three major sections: (1) Underlayer: nanotribological and nanomechanical properties of Cr thin films; (2) Magnetic layer: TEM observations of nanoindentations in soft metal layers; and (3) Overcoat: physical and nanomechanical properties of thin CNx overcoat deposited using various sputtering gases and related topics. Cu serves as the substitute for the magnetic layer for convenience, since the magnetic layer is usually a relatively soft metallic alloy.Subjects--Topical Terms:

1017759
Engineering, Materials Science.

Nanomechanical/nanotribological characterization of thin film materials for magnetic recording.
LDR:03457nmm 2200289 4500 001 1856052
005 20040616162818.5
008 130614s2003 eng d
035 $a (UnM)AAI3092386
035 $a AAI3092386
040 $a UnM $c UnM
100 1 $a Wei, Guohua. $3 1943846
245 1 0 $a Nanomechanical/nanotribological characterization of thin film materials for magnetic recording.
300 $a 154 p.
500 $a Source: Dissertation Abstracts International, Volume: 64-05, Section: B, page: 2350.
500 $a Chairperson: John A. Barnard.
502 $a Thesis (Ph.D.)--The University of Alabama, 2003.
520 $a Magnetic recording technology must support a rapidly increasing areal data density. In order to achieve the current goal, 1 Tbit/in<super>2</super>, the nanomechanical/nanotribological characterization of the thin film materials found in the key components of the magnetic media: the underlayer, the magnetic layer, and the overcoat, needs to be investigated systematically. Accordingly, the dissertation is divided into three major sections: (1) Underlayer: nanotribological and nanomechanical properties of Cr thin films; (2) Magnetic layer: TEM observations of nanoindentations in soft metal layers; and (3) Overcoat: physical and nanomechanical properties of thin CNx overcoat deposited using various sputtering gases and related topics. Cu serves as the substitute for the magnetic layer for convenience, since the magnetic layer is usually a relatively soft metallic alloy.
520 $a Cr thin films exhibit different nanotribological properties in ramped and constant load scratch tests. Under the same (maximum) load, constant load tests exhibit higher displacements, while broader and shallower wear tracks were found in ramped load experiments. 2 nm thin Cr enhances the hardness of 10 nm Cu deposited onto it, indicating that ultra-thin Cr underlayer exhibits excellent adhesive properties. The inverse Hall-Petch relationship is proposed to be operative in this ultra-thin film regime. A new method is developed to make ultra-thin TEM samples containing nanoindents. 10&sim;20 nm Cu films were deposited onto 100&sim;200 μm Si3N4 membrane Windows™ TEM grids and ultra shallow nanoindents were made. TEM observations show that under nanoindentation, the Cu thin films were plastically deformed and a microtexture, i.e., larger grains and preferred orientations, was formed within the indent region. It is proposed that the deformation-induced recrystallization at low temperatures may be the mechanism responsible for the formation of the microtexture. As the mass of the sputtering gases increases, the density and hardness of CNx slightly increases, while the deposition rate, compressive stress, surface roughness and pin-hole density of CN x decrease. The reaction between CNx and CoPtCr will produce CrNx, whose structural and nanomechanical/nanotribological properties were investigated systematically in the dissertation to understand how well CrNx can contribute to the wear strength of CNx/CoPtCr bilayer.
590 $a School code: 0004.
650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Engineering, Mechanical. $3 783786
650 4 $a Engineering, Metallurgy. $3 1023648
690 $a 0794
690 $a 0548
690 $a 0743
710 2 0 $a The University of Alabama. $3 1019361
773 0 $t Dissertation Abstracts International $g 64-05B.
790 1 0 $a Barnard, John A., $e advisor
790 $a 0004
791 $a Ph.D.
792 $a 2003
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3092386