Language:
English
繁體中文
Help
回圖書館首頁
手機版館藏查詢
Login
Back
Switch To:
Labeled
|
MARC Mode
|
ISBD
The application of shadow mask evapo...
~
Zhou, Yangxin.
Linked to FindBook
Google Book
Amazon
博客來
The application of shadow mask evaporation in molecular electronics.
Record Type:
Electronic resources : Monograph/item
Title/Author:
The application of shadow mask evaporation in molecular electronics./
Author:
Zhou, Yangxin.
Description:
167 p.
Notes:
Source: Dissertation Abstracts International, Volume: 64-04, Section: B, page: 1778.
Contained By:
Dissertation Abstracts International64-04B.
Subject:
Physics, Condensed Matter. -
Online resource:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3087492
ISBN:
0496352628
The application of shadow mask evaporation in molecular electronics.
Zhou, Yangxin.
The application of shadow mask evaporation in molecular electronics.
- 167 p.
Source: Dissertation Abstracts International, Volume: 64-04, Section: B, page: 1778.
Thesis (Ph.D.)--University of Pennsylvania, 2003.
The successful development of carbon-nanotube based nanoscale electronics during last decade has stimulated great interests in molecular electronics beyond nanotubes. This extension has been hindered by fabrication of molecular circuits with conventional e-beam lithography. We have developed a shadow mask evaporation (SME) method to fabricate sub-micrometer metallic electrodes and other structures without using lithographic resists (e.g. photoresist or electron beam resist). We have fabricated electrode pairs with gaps as small as 200 nm, and I will discuss a method that we believe will allow reproducible fabrication of gaps smaller than 10 nm. We have used these shadow masks in a resist-free process to contact DNA strands on mica, carbon nanotubes on Si, as well as to create an etch mask for fabricating 200 nm polymer nanowires. High bias transport measurement shows that the saturation current of metallic carbon nanotubes is always enlarged in a two-probe measurement and can be used to estimate contact resistance. Carbon nanotubes can endure high voltages as high as 40 V Nanotubes break down when the tube temperature reaches the burning temperature. For a micrometer-long nanotube, most of the heat generated by the current is dissipated through the substrate at high bias. The longer the nanotube, the higher voltage it can sustain. We also report fabrication of sub-30 nm conducting polymer nanofiber with tunable resistance. Characterization by scanning conductance microscopy shows the dependence of conductivity on nanofiber diameter. This is confirmed by transport measurements on nanofibers contacted by SME. Transport measurements also provide evidence for the formation of Schottky barriers at the fiber-electrode interface, leading to rectifying behavior in asymmetric fiber samples.
ISBN: 0496352628Subjects--Topical Terms:
1018743
Physics, Condensed Matter.
The application of shadow mask evaporation in molecular electronics.
LDR
:02694nmm 2200277 4500
001
1843730
005
20051017073354.5
008
130614s2003 eng d
020
$a
0496352628
035
$a
(UnM)AAI3087492
035
$a
AAI3087492
040
$a
UnM
$c
UnM
100
1
$a
Zhou, Yangxin.
$3
1931949
245
1 4
$a
The application of shadow mask evaporation in molecular electronics.
300
$a
167 p.
500
$a
Source: Dissertation Abstracts International, Volume: 64-04, Section: B, page: 1778.
500
$a
Adviser: Alan T. Johnson.
502
$a
Thesis (Ph.D.)--University of Pennsylvania, 2003.
520
$a
The successful development of carbon-nanotube based nanoscale electronics during last decade has stimulated great interests in molecular electronics beyond nanotubes. This extension has been hindered by fabrication of molecular circuits with conventional e-beam lithography. We have developed a shadow mask evaporation (SME) method to fabricate sub-micrometer metallic electrodes and other structures without using lithographic resists (e.g. photoresist or electron beam resist). We have fabricated electrode pairs with gaps as small as 200 nm, and I will discuss a method that we believe will allow reproducible fabrication of gaps smaller than 10 nm. We have used these shadow masks in a resist-free process to contact DNA strands on mica, carbon nanotubes on Si, as well as to create an etch mask for fabricating 200 nm polymer nanowires. High bias transport measurement shows that the saturation current of metallic carbon nanotubes is always enlarged in a two-probe measurement and can be used to estimate contact resistance. Carbon nanotubes can endure high voltages as high as 40 V Nanotubes break down when the tube temperature reaches the burning temperature. For a micrometer-long nanotube, most of the heat generated by the current is dissipated through the substrate at high bias. The longer the nanotube, the higher voltage it can sustain. We also report fabrication of sub-30 nm conducting polymer nanofiber with tunable resistance. Characterization by scanning conductance microscopy shows the dependence of conductivity on nanofiber diameter. This is confirmed by transport measurements on nanofibers contacted by SME. Transport measurements also provide evidence for the formation of Schottky barriers at the fiber-electrode interface, leading to rectifying behavior in asymmetric fiber samples.
590
$a
School code: 0175.
650
4
$a
Physics, Condensed Matter.
$3
1018743
650
4
$a
Chemistry, Polymer.
$3
1018428
690
$a
0611
690
$a
0495
710
2 0
$a
University of Pennsylvania.
$3
1017401
773
0
$t
Dissertation Abstracts International
$g
64-04B.
790
1 0
$a
Johnson, Alan T.,
$e
advisor
790
$a
0175
791
$a
Ph.D.
792
$a
2003
856
4 0
$u
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3087492
based on 0 review(s)
Location:
ALL
電子資源
Year:
Volume Number:
Items
1 records • Pages 1 •
1
Inventory Number
Location Name
Item Class
Material type
Call number
Usage Class
Loan Status
No. of reservations
Opac note
Attachments
W9193244
電子資源
11.線上閱覽_V
電子書
EB
一般使用(Normal)
On shelf
0
1 records • Pages 1 •
1
Multimedia
Reviews
Add a review
and share your thoughts with other readers
Export
pickup library
Processing
...
Change password
Login