紀錄類型: |
書目-電子資源
: Monograph/item
|
正題名/作者: |
Handbook of thin-film deposition processes and techniques/ edited by Krishna Seshan.{me_controlnum} |
其他題名: |
principles, methods, equipment and applications / |
其他作者: |
Seshan, Krishna. |
出版者: |
Norwich, N.Y. :Noyes Publications/William Andrew Pub., : c2002., |
面頁冊數: |
1 online resource (xxviii, 629 p.) :ill. |
內容註: |
Foreword: Gordon Moore -- Recent Changes in the Semiconductor Industry -- Deposition Technologies and Applications: Introduction and Overview -- Silicon Epitaxy by Chemical Vapor Deposition -- Chemical Vapor Deposition of Silicon Dioxide Films -- Metal Organic Chemical Vapor Deposition -- Feature Scale Modeling -- The Role of Metrology and Inspection to Semiconductor Processing -- Contamination Control, Defect Detection and Yield Enhancement in Gigabit Manufacturing -- Sputtering and Sputter Deposition -- Laser and Electron Beam Assisted Processing -- Molecular Beam Epitaxy: Equipment and Practice -- Ion Beam Deposition -- Chemical Mechanical Polishing -- Organic Dielectrics in Multilevel Metallization of Integrated Circuits -- Performance, Processing, and Lithography Trends -- Index. |
標題: |
Thin film devices - Handbooks, manuals, etc. - Design and construction - |
電子資源: |
http://www.sciencedirect.com/science/book/9780815514428 |
ISBN: |
1591241936 (electronic bk.) |