30奈米以下絕緣體上多閘極金氧半場效電晶體模擬之研究 = = Inve...
謝永裕

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  • 30奈米以下絕緣體上多閘極金氧半場效電晶體模擬之研究 = = Investigation of the Dimension Effects of 30-nm Below Multiple-Gate SOI MOSFETs by TCAD Simulation /
  • Record Type: Language materials, printed : Monograph/item
    Title/Author: 30奈米以下絕緣體上多閘極金氧半場效電晶體模擬之研究 = / 謝永裕著
    Reminder of title: Investigation of the Dimension Effects of 30-nm Below Multiple-Gate SOI MOSFETs by TCAD Simulation /
    remainder title: Investigation of the Dimension Effects of 30-nm Below Multiple-Gate SOI MOSFETs by TCAD Simulation
    Author: 謝永裕
    other author: 劉耿銘
    Published: [花蓮縣壽豐鄉] : [國立東華大學電機工程學系], : 民100[2011],
    Description: 62面 : 圖,表 ; 30公分
    Notes: 指導教授:劉耿銘
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  • 1 records • Pages 1 •
 
GE0120900 五樓論文區 (5F Theses & Dissertations) 03.不外借_N 本校碩士論文 T 448.6 0433 2011 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
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