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Well-aligned 3-dimensional self-asse...

Ahn, Dae Up.

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Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications.

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications./
作者:	Ahn, Dae Up.
面頁冊數:	213 p.
附註:	Adviser: Erol Sancaktar.
Contained By:	Dissertation Abstracts International68-12B.
標題:	Chemistry, Polymer. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3292834
ISBN:	9780549362500

Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications.
Ahn, Dae Up.

Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications. - 213 p.

Adviser: Erol Sancaktar.

Thesis (Ph.D.)--The University of Akron, 2007.

Therefore, we illustrate a novel nanofabrication technique using a top-down after bottom-up method to create new opportunities for the fabrication of low-cost and high-throughput nanostructured materials with highly ordered 3-dimensional nanopatterns.

ISBN: 9780549362500Subjects--Topical Terms:

1018428
Chemistry, Polymer.

Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications.
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245 1 0 $a Well-aligned 3-dimensional self-assembly in block copolymers and their nanotechnological applications.
300 $a 213 p.
500 $a Adviser: Erol Sancaktar.
500 $a Source: Dissertation Abstracts International, Volume: 68-12, Section: B, page: 8379.
502 $a Thesis (Ph.D.)--The University of Akron, 2007.
520 $a Therefore, we illustrate a novel nanofabrication technique using a top-down after bottom-up method to create new opportunities for the fabrication of low-cost and high-throughput nanostructured materials with highly ordered 3-dimensional nanopatterns.
520 $a We have prepared well-aligned 3-dimensional block copolymer nano-cylinders over the entire sample area and thickness without any additional external field applications such as mechanical and electric fields. Self-assembled 3-dimensional perpendicular cylinder orientation was achieved by thermodynamic controls of incompatibility between the block components, and further elaborate modification of size and hexagonal alignment of perpendicular cylinders was also accomplished by kinetic controls of diffusive molecular mobility of block copolymer microdomains. Since those two controls have been mainly achieved by simple blending of minority homopolymer, the intrinsic advantages of block copolymer nanopatterning, such as fast and spontaneous 3-dimensional nanopatterning with a high thermodynamic stability and reproducibility, have been completely preserved in this fabrication strategy.
520 $a After preparing block copolymer masks containing perpendicularly and hexagonally well-aligned nano-cylinders, a top-down method using excimer laser was applied to the block copolymer masks for a fast nanopattern transfer to organic and inorganic substrates in the form of nano-dots. Mask-image-like high-density polystyrene and silicon nano-dots were readily obtained after the one-step excimer laser irradiation on the block copolymer masks without any additional selective staining and/or etching steps before a non-selective etching process. The numerical analysis on the photothermal excimer laser ablation of periodically nanostructured block copolymer masks revealed that sufficiently low laser intensity was suitable for the one-step fabrication of mask image-like topographic nanopatterns on the surface of silicon substrates, as long as the intensity was high enough to induce a matrix-assisted photothermal excimer laser ablation in less UV-sensitive block component.
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