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Deposition of vanadium (V) oxide thi...

Case Western Reserve University.

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Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers.

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers./
Author:	Shyue, Jing-Jong.
Description:	169 p.
Notes:	Adviser: Mark R. De Guire.
Contained By:	Masters Abstracts International41-03.
Subject:	Chemistry, Inorganic. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=1411233
ISBN:	9780493869230

Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers.
Shyue, Jing-Jong.

Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers. - 169 p.

Adviser: Mark R. De Guire.

Thesis (M.S.)--Case Western Reserve University, 2002.

The forces between different nitrogen-containing SAMs and spherical zirconia particles were investigated by using atomic force microscopy (AFM). These results indicated the existence of a Stern layer, i.e. charge inversion, on the amine surface.

ISBN: 9780493869230Subjects--Topical Terms:

517253
Chemistry, Inorganic.

Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers.
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020 $a 9780493869230
035 $a (UMI)AAI1411233
035 $a AAI1411233
040 $a UMI $c UMI
100 1 $a Shyue, Jing-Jong. $3 1025145
245 1 0 $a Deposition of vanadium (V) oxide thin films on nitrogen-containing self-assembled monolayers.
300 $a 169 p.
500 $a Adviser: Mark R. De Guire.
500 $a Source: Masters Abstracts International, Volume: 41-03, page: 0846.
502 $a Thesis (M.S.)--Case Western Reserve University, 2002.
520 $a The forces between different nitrogen-containing SAMs and spherical zirconia particles were investigated by using atomic force microscopy (AFM). These results indicated the existence of a Stern layer, i.e. charge inversion, on the amine surface.
520 $a Vanadium oxide films have been deposited from aqueous solutions at low temperature on different self-assembled monolayer- (SAM-) modified silicon surfaces. Primary, secondary, and tertiary amine and ammonium salt SAMs were made via in-situ transformations of bromide SAMs. The degree of surface charge of SAM was estimated by using X-ray photoelectron spectroscopy (XPS).
520 $a The crystal structure and chemical composition of the vanadium oxide films were characterized by X-ray diffraction (XRD), and XPS, respectively. The thickness of the vanadium oxide coatings was similar on 1°-, 2°-, and 3°-amine SAMs, but that on alkylammonium salt SAM was 3--4 times thicker. In all cases, V2O5·1.6H2O formed first (in the first 24 h), then V2O5·H 2O formed. The film growth rate showed two separate growth periods corresponding to the formation of these two phases.
520 $a Mixed-valence and mixed-phase vanadium oxide films could be achieved by controlling the deposition conditions, whose effect on the kinetics of film growth has also been studied. Films up to 80 mum thick on ammonium salt SAM and 16 mum thick on amine SAM were grown in 72 h.
590 $a School code: 0042.
650 4 $a Chemistry, Inorganic. $3 517253
650 4 $a Chemistry, Organic. $3 516206
650 4 $a Engineering, Materials Science. $3 1017759
690 $a 0488
690 $a 0490
690 $a 0794
710 2 $a Case Western Reserve University. $3 1017714
773 0 $t Masters Abstracts International $g 41-03.
790 $a 0042
790 1 0 $a De Guire, Mark R., $e advisor
791 $a M.S.
792 $a 2002
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoeng/servlet/advanced?query=1411233