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Chemical vapor deposition : = princi...

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Hitchman, Michael L.

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Chemical vapor deposition : = principles and applications /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Chemical vapor deposition :/ edited by Michael L. Hitchman and Klavs F. Jensen.
Reminder of title:	principles and applications /
other author:	Hitchman, Michael L.
Published:	London ;Academic Press, : c1993.,
Description:	v, 677 p. :ill. ;24 cm.
Subject:	Chemical vapor deposition. -
ISBN:	0123496705 :

Chemical vapor deposition : = principles and applications /
Chemical vapor deposition :principles and applications /edited by Michael L. Hitchman and Klavs F. Jensen. - London ;Academic Press,c1993. - v, 677 p. :ill. ;24 cm.

Includes bibliographical references and index.

ISBN: 0123496705 :US350.00

LCCN: 93125773Subjects--Topical Terms:

621056
Chemical vapor deposition.

LC Class. No.: TS695 / .C54 1993

Dewey Class. No.: 620/.44

Chemical vapor deposition : = principles and applications /
LDR:00684nam a2200217 a 45 001 685919
003 DLC
005 20081024
008 021218s1993 enka b 001 0 eng d
010 $a 93125773
020 $a 0123496705 : $c US350.00
020 $a 9780123496706
035 $a (OCoLC)27995365
035 $a LIB97T06010
040 $a ViBlbV $c ViBlbV $d IU $d DLC $d DH
042 $a lccopycat
050 0 0 $a TS695 $b .C54 1993
082 0 0 $a 620/.44 $2 20
245 0 0 $a Chemical vapor deposition : $b principles and applications / $c edited by Michael L. Hitchman and Klavs F. Jensen.
260 $a London ; $a San Diego : $c c1993. $b Academic Press,
300 $a v, 677 p. : $b ill. ; $c 24 cm.
504 $a Includes bibliographical references and index.
650 $a Chemical vapor deposition. $3 621056
700 $a Hitchman, Michael L. $3 730510
700 $a Jensen, Klavs F., $d 1952- $3 730511

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W0061264

六樓西文書區HC-Z(6F Western Language Books)

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TS695 C54 1993

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