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Modeling of chemical vapor depositio...

~

Werner, Christoph, (1949-)

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Modeling of chemical vapor deposition of tungsten films /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Modeling of chemical vapor deposition of tungsten films // Chris R. Kleijn, Christoph Werner.
作者:	Kleijn, Chris R.,
其他作者:	Werner, Christoph,
出版者:	Basel ;Birkh醀user Verlag, : 1993.,
面頁冊數:	138 p. :ill. ;23 cm.
叢書名:	Progress in numerical simulation for microelectronics ;
標題:	Semiconductor films - Mathematical models. -
ISBN:	0817628584 (Boston : acid-free paper)

Modeling of chemical vapor deposition of tungsten films /
Kleijn, Chris R.,1960-

Modeling of chemical vapor deposition of tungsten films /Chris R. Kleijn, Christoph Werner. - Basel ;Birkh醀user Verlag,1993. - 138 p. :ill. ;23 cm. - Progress in numerical simulation for microelectronics ;vol. 2.

Includes bibliographical references.

ISBN: 0817628584 (Boston : acid-free paper)

LCCN: 92044681Subjects--Topical Terms:

663284
Semiconductor films
--Mathematical models.

LC Class. No.: TK7871.15.F5 / K53 1993

Dewey Class. No.: 621.3815/2

Modeling of chemical vapor deposition of tungsten films /
LDR:00729nam a2200205 a 45 001 649507
003 DLC
005 19930420065618.8
008 921211s1993 sz a b 000 0 eng
010 $a 92044681
020 $a 0817628584 (Boston : acid-free paper)
020 $a 3764328584 (Basel : acid-free paper) : $c 91.00 S Fr.
035 $a dt 00009908
040 $a DLC $c DLC $d DLC
050 0 0 $a TK7871.15.F5 $b K53 1993
082 0 0 $a 621.3815/2 $2 20
100 $a Kleijn, Chris R., $d 1960- $3 663283
245 1 0 $a Modeling of chemical vapor deposition of tungsten films / $c Chris R. Kleijn, Christoph Werner.
260 $a Basel ; $a Boston : $c 1993. $b Birkh醀user Verlag,
300 $a 138 p. : $b ill. ; $c 23 cm.
440 0 $a Progress in numerical simulation for microelectronics ; $v vol. 2
504 $a Includes bibliographical references.
650 $a Semiconductor films $x Mathematical models. $3 663284
650 $a Vapor-plating $x Mathematical models. $3 663285
700 $a Werner, Christoph, $d 1949- $3 663282

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TK7871.15.F5 K63 1993

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