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Manipulation of Ultrashort Pulses wi...

Zhang, Dapeng.

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Manipulation of Ultrashort Pulses with Digital Masks.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Manipulation of Ultrashort Pulses with Digital Masks./
作者:	Zhang, Dapeng.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 2015,
面頁冊數:	108 p.
附註:	Source: Dissertations Abstracts International, Volume: 78-06, Section: B.
Contained By:	Dissertations Abstracts International78-06B.
標題:	Electrical engineering. -
電子資源:	https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10297370
ISBN:	9781369410983

Manipulation of Ultrashort Pulses with Digital Masks.
Zhang, Dapeng.

Manipulation of Ultrashort Pulses with Digital Masks. - Ann Arbor : ProQuest Dissertations & Theses, 2015 - 108 p.

Source: Dissertations Abstracts International, Volume: 78-06, Section: B.

Thesis (Ph.D.)--The Chinese University of Hong Kong (Hong Kong), 2015.

This item is not available from ProQuest Dissertations & Theses.

The aim of this research was to develop new techniques and related theories for manipulating ultrashort pulses for high-speed applications. The new binary pulse shaping method enables simultaneous amplitude and phase shaping of any high-pulse-energy lasers at a speed of 32 kHz. These results are important as they form a critical tool for precisely controlling the laser pulses in many emerging scientific applications including controlling the motion of quantum states, photochemical reactions, laser coherence, biological imaging, laser microfabrication, and optical communications. The digital masks in this work were physically formed by a digital micromirror device (DMD), which consists of a large array of binary microscopic mirrors that can be operated at high speeds (4 - 32 kHz). Like the most pulse shaping methods, the digital masks were placed at the Fourier plane of a quasi-4f system to modulate the phase or spectrum amplitude of ultrashort pulses. Theoretical analyses and numerical simulation have been performed to understand the diffraction properties and predict the fundamental performance limit of digital masks generated by large arrays of binary micromirrors. The evolution of the ultrashort pulses during the modulation was modeled and illustrated. Digital patterns required to manipulate the phase and spectrum amplitude of ultrashort pulses were derived. The theoretical development also provides insight and practical solutions on modulating the dispersion introduced by the binary devices and accordingly optimizing the system efficiency. Based on the theoretical development, pulse shaping experiments were performed to demonstrate (1) how arbitrary phase modulation can be achieved with digital masks by introducing a detour phase in its non-zero diffraction orders, and (2) how arbitrary spectrum amplitude modulation can be achieved with digital masks by utilizing the zeroth order diffraction, and (3) how laser intensity distribution can be controlled three-dimensionally by combining the digital masks with temporally focused ultrashort pulses, thereby realizing high-throughput depth resolved laser microfabrication. Preliminary results show direct patterning of silicon of 80 x 60 μm2 with 500 nm resolution within 5 - 10 ultrashort pulses with a surface roughness of ∼ 60 nm RMS. This work forms a body of knowledge - design rules, principles and best practices - for modulating ultrashort pulses with digital masks. The theoretical and experimental results in this work are applicable to other digital device-based light field modulation methods.

ISBN: 9781369410983Subjects--Topical Terms:

649834
Electrical engineering.
Subjects--Index Terms:

Digital masks

Manipulation of Ultrashort Pulses with Digital Masks.
LDR:04004nmm a2200421 4500 001 2282477
005 20211012150138.5
008 220723s2015 ||||||||||||||||| ||eng d
020 $a 9781369410983
035 $a (MiAaPQ)AAI10297370
035 $a AAI10297370
040 $a MiAaPQ $c MiAaPQ
100 1 $a Zhang, Dapeng. $3 3561279
245 1 0 $a Manipulation of Ultrashort Pulses with Digital Masks.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2015
300 $a 108 p.
500 $a Source: Dissertations Abstracts International, Volume: 78-06, Section: B.
500 $a Publisher info.: Dissertation/Thesis.
500 $a Advisor: Shih-Chi, Chen.
502 $a Thesis (Ph.D.)--The Chinese University of Hong Kong (Hong Kong), 2015.
506 $a This item is not available from ProQuest Dissertations & Theses.
506 $a This item must not be added to any third party search indexes.
506 $a This item must not be sold to any third party vendors.
520 $a The aim of this research was to develop new techniques and related theories for manipulating ultrashort pulses for high-speed applications. The new binary pulse shaping method enables simultaneous amplitude and phase shaping of any high-pulse-energy lasers at a speed of 32 kHz. These results are important as they form a critical tool for precisely controlling the laser pulses in many emerging scientific applications including controlling the motion of quantum states, photochemical reactions, laser coherence, biological imaging, laser microfabrication, and optical communications. The digital masks in this work were physically formed by a digital micromirror device (DMD), which consists of a large array of binary microscopic mirrors that can be operated at high speeds (4 - 32 kHz). Like the most pulse shaping methods, the digital masks were placed at the Fourier plane of a quasi-4f system to modulate the phase or spectrum amplitude of ultrashort pulses. Theoretical analyses and numerical simulation have been performed to understand the diffraction properties and predict the fundamental performance limit of digital masks generated by large arrays of binary micromirrors. The evolution of the ultrashort pulses during the modulation was modeled and illustrated. Digital patterns required to manipulate the phase and spectrum amplitude of ultrashort pulses were derived. The theoretical development also provides insight and practical solutions on modulating the dispersion introduced by the binary devices and accordingly optimizing the system efficiency. Based on the theoretical development, pulse shaping experiments were performed to demonstrate (1) how arbitrary phase modulation can be achieved with digital masks by introducing a detour phase in its non-zero diffraction orders, and (2) how arbitrary spectrum amplitude modulation can be achieved with digital masks by utilizing the zeroth order diffraction, and (3) how laser intensity distribution can be controlled three-dimensionally by combining the digital masks with temporally focused ultrashort pulses, thereby realizing high-throughput depth resolved laser microfabrication. Preliminary results show direct patterning of silicon of 80 x 60 μm2 with 500 nm resolution within 5 - 10 ultrashort pulses with a surface roughness of ∼ 60 nm RMS. This work forms a body of knowledge - design rules, principles and best practices - for modulating ultrashort pulses with digital masks. The theoretical and experimental results in this work are applicable to other digital device-based light field modulation methods.
590 $a School code: 1307.
650 4 $a Electrical engineering. $3 649834
650 4 $a Physics. $3 516296
650 4 $a Optics. $3 517925
653 $a Digital masks
653 $a Digital micromirror device
653 $a Dispersion
653 $a Femtosecond
653 $a Pulse shaping
653 $a Ultrashort laser
690 $a 0544
690 $a 0605
690 $a 0752
710 2 $a The Chinese University of Hong Kong (Hong Kong). $3 1017547
773 0 $t Dissertations Abstracts International $g 78-06B.
790 $a 1307
791 $a Ph.D.
792 $a 2015
793 $a English
856 4 0 $u https://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10297370