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Analysis and Modeling of Foundry Com...

Balaban, Mehmet Bugra.

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Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials.

Record Type:	Electronic resources : Monograph/item
Title/Author:	Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials./
Author:	Balaban, Mehmet Bugra.
Published:	Ann Arbor : ProQuest Dissertations & Theses, : 2020,
Description:	155 p.
Notes:	Source: Dissertations Abstracts International, Volume: 81-12.
Contained By:	Dissertations Abstracts International81-12.
Subject:	Electrical engineering. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=27834604
ISBN:	9798645456801

Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials.
Balaban, Mehmet Bugra.

Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials. - Ann Arbor : ProQuest Dissertations & Theses, 2020 - 155 p.

Source: Dissertations Abstracts International, Volume: 81-12.

Thesis (Ph.D.)--Arizona State University, 2020.

This item must not be sold to any third party vendors.

Programmable Metallization Cell (PMC) devices are, in essence, redox-based solid-state resistive switching devices that rely on ion transport through a solid electrolyte (SE) layer from anode to cathode. Analysis and modeling of the effect of different fabrication and processing parameter/conditions on PMC devices are crucial for future electronics. Furthermore, this work is even more significant for devices utilizing back-end- of-line (BEOL) compatible materials such as Cu, W, their oxides and SiOx as these devices offer cost effectiveness thanks to their inherent foundry-ready nature. In this dissertation, effect of annealing conditions and cathode material on the performance of Cu-SiOx vertical devices is investigated which shows that W-based devices have much lower forming voltage and initial resistance values. Also, higher annealing temperatures first lead to an increase in forming voltage from 400 °C to 500 °C, then a drastic decrease at 550 °C due to Cu island formation at the Cu/SiOx interface. Next, the characterization and modeling of the bilayer Cu2O/Cu-WO3 obtained by annealing the deposited Cu/WO3 stacks in air at BEOL-compatible temperatures is presented that display unique characteristics for lateral PMC devices. First, thin film oxidation kinetics of Cu is studied which show a parabolic relationship with annealing time and an activation energy of 0.70 eV. Grown Cu2O shows a cauliflower-like morphology where feature size on the surface increase with annealing time and temperature. Then, diffusion kinetics of Cu in WO3 is examined where the activation energy of diffusion of Cu into WO3 is calculated to be 0.74 eV. Cu was found to form clusters in the WO3 host which was revealed by imaging. Moreover, using the oxidation and diffusion analyses, a Matlab model is established for modeling the bilayer for process and annealing-condition optimization. The model is built to produce the resulting Cu2O thickness and Cu concentration in Cu-WO3. Additionally, material characterization, preliminary electrical results along with modeling of lateral PMC devices utilizing the bilayer is also demonstrated. By tuning the process parameters such as deposited Cu thickness and annealing conditions, a low-resistive Cu2O layer was achieved which dramatically enhanced the electrodeposition growth rate for lateral PMC devices.

ISBN: 9798645456801Subjects--Topical Terms:

649834
Electrical engineering.
Subjects--Index Terms:

Bilayer

Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials.
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245 1 0 $a Analysis and Modeling of Foundry Compatible Programmable Metallization Cell Materials.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 2020
300 $a 155 p.
500 $a Source: Dissertations Abstracts International, Volume: 81-12.
500 $a Advisor: Kozicki, Michael N.
502 $a Thesis (Ph.D.)--Arizona State University, 2020.
506 $a This item must not be sold to any third party vendors.
520 $a Programmable Metallization Cell (PMC) devices are, in essence, redox-based solid-state resistive switching devices that rely on ion transport through a solid electrolyte (SE) layer from anode to cathode. Analysis and modeling of the effect of different fabrication and processing parameter/conditions on PMC devices are crucial for future electronics. Furthermore, this work is even more significant for devices utilizing back-end- of-line (BEOL) compatible materials such as Cu, W, their oxides and SiOx as these devices offer cost effectiveness thanks to their inherent foundry-ready nature. In this dissertation, effect of annealing conditions and cathode material on the performance of Cu-SiOx vertical devices is investigated which shows that W-based devices have much lower forming voltage and initial resistance values. Also, higher annealing temperatures first lead to an increase in forming voltage from 400 °C to 500 °C, then a drastic decrease at 550 °C due to Cu island formation at the Cu/SiOx interface. Next, the characterization and modeling of the bilayer Cu2O/Cu-WO3 obtained by annealing the deposited Cu/WO3 stacks in air at BEOL-compatible temperatures is presented that display unique characteristics for lateral PMC devices. First, thin film oxidation kinetics of Cu is studied which show a parabolic relationship with annealing time and an activation energy of 0.70 eV. Grown Cu2O shows a cauliflower-like morphology where feature size on the surface increase with annealing time and temperature. Then, diffusion kinetics of Cu in WO3 is examined where the activation energy of diffusion of Cu into WO3 is calculated to be 0.74 eV. Cu was found to form clusters in the WO3 host which was revealed by imaging. Moreover, using the oxidation and diffusion analyses, a Matlab model is established for modeling the bilayer for process and annealing-condition optimization. The model is built to produce the resulting Cu2O thickness and Cu concentration in Cu-WO3. Additionally, material characterization, preliminary electrical results along with modeling of lateral PMC devices utilizing the bilayer is also demonstrated. By tuning the process parameters such as deposited Cu thickness and annealing conditions, a low-resistive Cu2O layer was achieved which dramatically enhanced the electrodeposition growth rate for lateral PMC devices.
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653 $a Copper oxidation
653 $a Material analysis and characterization
653 $a Programmable metallization cell
653 $a Resistive switching
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