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Studies on the Toxicity, Bioaccumula...
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Karimi, Sarah.
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Studies on the Toxicity, Bioaccumulation, and Biopersistence of Model and Commercial Chemical Mechanical Planarization Slurries with Daphnia magna.
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Studies on the Toxicity, Bioaccumulation, and Biopersistence of Model and Commercial Chemical Mechanical Planarization Slurries with Daphnia magna./
作者:
Karimi, Sarah.
出版者:
Ann Arbor : ProQuest Dissertations & Theses, : 2018,
面頁冊數:
154 p.
附註:
Source: Dissertations Abstracts International, Volume: 80-05, Section: B.
Contained By:
Dissertations Abstracts International80-05B.
標題:
Analytical chemistry. -
電子資源:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=11004206
ISBN:
9780438579286
Studies on the Toxicity, Bioaccumulation, and Biopersistence of Model and Commercial Chemical Mechanical Planarization Slurries with Daphnia magna.
Karimi, Sarah.
Studies on the Toxicity, Bioaccumulation, and Biopersistence of Model and Commercial Chemical Mechanical Planarization Slurries with Daphnia magna.
- Ann Arbor : ProQuest Dissertations & Theses, 2018 - 154 p.
Source: Dissertations Abstracts International, Volume: 80-05, Section: B.
Thesis (Ph.D.)--The University of Texas at Dallas, 2018.
This item must not be sold to any third party vendors.
Nanoparticle (NP) abrasives are components of chemical mechanical planarization (CMP) slurries used to polish wafers of semiconducting materials such as silicon. The semiconductor industry is interested in understanding the potential environmental toxicity associated with CMP NPs because the NPs may be discharged to aquatic ecosystems. However, assessing the toxicity of these specialized CMP NPs is challenging because commercial slurries may contain undefined toxic constituents. In response to this challenge, a manufacturer produced four model CMP slurries comprising colloidal or fumed silicon oxide (c-SiO2 or f-SiO2), cerium oxide (CeO2), or aluminum oxide (Al2O3) NPs without known soluble toxicants to permit toxicity assessments of actual NPs used in commercial CMP slurries. This dissertation presents, for the first time, studies on the acute and chronic toxicities, the bioaccumulation, and the biopersistence of model CMP NPs with Daphnia magna (D. magna) - a fresh-water organism used in ecotoxicity assessments. The major findings presented in chapter two are that different model CMP slurries exert distinct effects on D. magna morbidity, growth, and reproductive output, and that the CeO2 and Al2O3 CMP slurries severely reduced D. magna reproduction upon chronic exposure at sub-lethal applied doses, which could have adverse consequences to aquatic ecosystems. The major findings presented in chapter two are that different model CMP slurries exert distinct effects on D. magna morbidity, growth, and reproductive output, and that the CeO2 and Al2O3 CMP slurries severely reduced D. magna reproduction upon chronic exposure at sub-lethal applied doses, which could have adverse consequences to aquatic ecosystems. The major findings in chapter three are that CeO2 and Al2O3 NPs were accumulated in different amounts by D. magna, and that after 48 h of depuration, D. magna exposed to 0.10 mg/mL CeO2 eliminated 85% of the CeO2 load, and D. magna exposed to 0.10 mg/mL of Al2O3 eliminated 78% of the Al2O 3 load. The fourth and the final chapter of this dissertation addresses the question of whether polishing a gallium arsenide (GaAs) wafer can impart added toxicity to CMP NPs. Using a commercial c-SiO2 CMP slurry (Ultra-Sol® 200S), the key findings were that neither the pristine or spent slurry at 0.10 mg/mL c-SiO2 NPs was toxic after a 21-day exposure, but both slurries led to a slight increase in body size and a ∼2-fold increase in reproduction, indicative of a hormetic response. Further testing revealed that the effector was a soluble component(s) in the pristine slurry, and not the pristine or spent NPs.
ISBN: 9780438579286Subjects--Topical Terms:
3168300
Analytical chemistry.
Subjects--Index Terms:
Abrasives
Studies on the Toxicity, Bioaccumulation, and Biopersistence of Model and Commercial Chemical Mechanical Planarization Slurries with Daphnia magna.
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Nanoparticle (NP) abrasives are components of chemical mechanical planarization (CMP) slurries used to polish wafers of semiconducting materials such as silicon. The semiconductor industry is interested in understanding the potential environmental toxicity associated with CMP NPs because the NPs may be discharged to aquatic ecosystems. However, assessing the toxicity of these specialized CMP NPs is challenging because commercial slurries may contain undefined toxic constituents. In response to this challenge, a manufacturer produced four model CMP slurries comprising colloidal or fumed silicon oxide (c-SiO2 or f-SiO2), cerium oxide (CeO2), or aluminum oxide (Al2O3) NPs without known soluble toxicants to permit toxicity assessments of actual NPs used in commercial CMP slurries. This dissertation presents, for the first time, studies on the acute and chronic toxicities, the bioaccumulation, and the biopersistence of model CMP NPs with Daphnia magna (D. magna) - a fresh-water organism used in ecotoxicity assessments. The major findings presented in chapter two are that different model CMP slurries exert distinct effects on D. magna morbidity, growth, and reproductive output, and that the CeO2 and Al2O3 CMP slurries severely reduced D. magna reproduction upon chronic exposure at sub-lethal applied doses, which could have adverse consequences to aquatic ecosystems. The major findings presented in chapter two are that different model CMP slurries exert distinct effects on D. magna morbidity, growth, and reproductive output, and that the CeO2 and Al2O3 CMP slurries severely reduced D. magna reproduction upon chronic exposure at sub-lethal applied doses, which could have adverse consequences to aquatic ecosystems. The major findings in chapter three are that CeO2 and Al2O3 NPs were accumulated in different amounts by D. magna, and that after 48 h of depuration, D. magna exposed to 0.10 mg/mL CeO2 eliminated 85% of the CeO2 load, and D. magna exposed to 0.10 mg/mL of Al2O3 eliminated 78% of the Al2O 3 load. The fourth and the final chapter of this dissertation addresses the question of whether polishing a gallium arsenide (GaAs) wafer can impart added toxicity to CMP NPs. Using a commercial c-SiO2 CMP slurry (Ultra-Sol® 200S), the key findings were that neither the pristine or spent slurry at 0.10 mg/mL c-SiO2 NPs was toxic after a 21-day exposure, but both slurries led to a slight increase in body size and a ∼2-fold increase in reproduction, indicative of a hormetic response. Further testing revealed that the effector was a soluble component(s) in the pristine slurry, and not the pristine or spent NPs.
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http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=11004206
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