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Pattern recognition and image analys...
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IbPRIA (Conference) (2019 :)
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Pattern recognition and image analysis = 9th Iberian Conference, IbPRIA 2019, Madrid, Spain, July 1-4, 2019 : proceedings.. Part II /
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Pattern recognition and image analysis/ edited by Aythami Morales ... [et al.].
其他題名:
9th Iberian Conference, IbPRIA 2019, Madrid, Spain, July 1-4, 2019 : proceedings.
其他題名:
IbPRIA 2019
其他作者:
Morales, Aythami.
團體作者:
IbPRIA (Conference)
出版者:
Cham :Springer International Publishing : : 2019.,
面頁冊數:
xxi, 534 p. :ill. (some col.), digital ;24 cm.
Contained By:
Springer eBooks
標題:
Optical pattern recognition - Congresses. -
電子資源:
https://doi.org/10.1007/978-3-030-31321-0
ISBN:
9783030313210
Pattern recognition and image analysis = 9th Iberian Conference, IbPRIA 2019, Madrid, Spain, July 1-4, 2019 : proceedings.. Part II /
Pattern recognition and image analysis
9th Iberian Conference, IbPRIA 2019, Madrid, Spain, July 1-4, 2019 : proceedings.Part II /[electronic resource] :IbPRIA 2019edited by Aythami Morales ... [et al.]. - Cham :Springer International Publishing :2019. - xxi, 534 p. :ill. (some col.), digital ;24 cm. - Lecture notes in computer science,118680302-9743 ;. - Lecture notes in computer science ;11868..
This 2-volume set constitutes the refereed proceedings of the 9th Iberian Conference on Pattern Recognition and Image Analysis, IbPRIA 2019, held in Madrid, Spain, in July 2019. The 99 papers in these volumes were carefully reviewed and selected from 137 submissions. They are organized in topical sections named: Part I: best ranked papers; machine learning; pattern recognition; image processing and representation. Part II: biometrics; handwriting and document analysis; other applications.
ISBN: 9783030313210
Standard No.: 10.1007/978-3-030-31321-0doiSubjects--Topical Terms:
695832
Optical pattern recognition
--Congresses.
LC Class. No.: TA1650 / .I27 2019
Dewey Class. No.: 006.4
Pattern recognition and image analysis = 9th Iberian Conference, IbPRIA 2019, Madrid, Spain, July 1-4, 2019 : proceedings.. Part II /
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