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Plasma etching processes for CMOS de...

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Posseme, Nicolas,

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Plasma etching processes for CMOS device realization /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Plasma etching processes for CMOS device realization // edited by Nicolas Posseme.
其他作者:	Posseme, Nicolas,
面頁冊數:	1 online resource (x, 121 pages) :illustrations
標題:	Metal oxide semiconductors, Complementary. -
電子資源:	https://www.sciencedirect.com/science/book/9781785480966
ISBN:	9780081011966

Plasma etching processes for CMOS device realization /
Plasma etching processes for CMOS device realization /edited by Nicolas Posseme. - 1 online resource (x, 121 pages) :illustrations

Includes bibliographical references and index.

ISBN: 9780081011966Subjects--Topical Terms:

649504
Metal oxide semiconductors, Complementary.
Index Terms--Genre/Form:

542853
Electronic books.

LC Class. No.: TK7871.99.M44 / P63 2017

Dewey Class. No.: 621.39/732

Plasma etching processes for CMOS device realization /
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504 $a Includes bibliographical references and index.
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