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Plasma etching processes for CMOS de...
~
Posseme, Nicolas,
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Plasma etching processes for CMOS device realization /
Record Type:
Electronic resources : Monograph/item
Title/Author:
Plasma etching processes for CMOS device realization // edited by Nicolas Posseme.
other author:
Posseme, Nicolas,
Description:
1 online resource (x, 121 pages) :illustrations
Subject:
Metal oxide semiconductors, Complementary. -
Online resource:
https://www.sciencedirect.com/science/book/9781785480966
ISBN:
9780081011966
Plasma etching processes for CMOS device realization /
Plasma etching processes for CMOS device realization /
edited by Nicolas Posseme. - 1 online resource (x, 121 pages) :illustrations
Includes bibliographical references and index.
ISBN: 9780081011966Subjects--Topical Terms:
649504
Metal oxide semiconductors, Complementary.
Index Terms--Genre/Form:
542853
Electronic books.
LC Class. No.: TK7871.99.M44 / P63 2017
Dewey Class. No.: 621.39/732
Plasma etching processes for CMOS device realization /
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edited by Nicolas Posseme.
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https://www.sciencedirect.com/science/book/9781785480966
based on 0 review(s)
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Items
1 records • Pages 1 •
1
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Attachments
W9372080
電子資源
11.線上閱覽_V
電子書
EB TK7871.99.M44 P63 2017
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0
1 records • Pages 1 •
1
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