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Potential environmental and health r...

Zeng, Chao.

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Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing./
作者:	Zeng, Chao.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 2017,
面頁冊數:	116 p.
附註:	Source: Dissertation Abstracts International, Volume: 78-07(E), Section: B.
Contained By:	Dissertation Abstracts International78-07B(E).
標題:	Environmental engineering. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=10254262
ISBN:	9781369564303

Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing.
Zeng, Chao.

Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing. - Ann Arbor : ProQuest Dissertations & Theses, 2017 - 116 p.

Source: Dissertation Abstracts International, Volume: 78-07(E), Section: B.

Thesis (Ph.D.)--The University of Arizona, 2017.

The objective of this work is to investigate the potential environmental and health risks from the ENPs and III-V materials used in semiconductor manufacturing. To this end, the physical, chemical and toxicological characterization of ENPs used in CMP was performed. Furthermore, the fate and transport of the most used ENP, SiO2, in porous media was studied. In addition, acute toxicity of As(III), As(V), In(III) and Ga(III) species was evaluated using different bioassays. Finally, the cytotoxicity of ENPs used in CMP slurries to human lung bronchial epithelial cells was evaluated using an impedance based real time cell analysis (RTCA) assay.

ISBN: 9781369564303Subjects--Topical Terms:

548583
Environmental engineering.

Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing.
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245 1 0 $a Potential environmental and health risks from nanoparticles and III-V materials used in semiconductor manufacturing.
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300 $a 116 p.
500 $a Source: Dissertation Abstracts International, Volume: 78-07(E), Section: B.
500 $a Advisers: Reyes Sierra-Alvarez; Farhang Shadman.
502 $a Thesis (Ph.D.)--The University of Arizona, 2017.
520 $a The objective of this work is to investigate the potential environmental and health risks from the ENPs and III-V materials used in semiconductor manufacturing. To this end, the physical, chemical and toxicological characterization of ENPs used in CMP was performed. Furthermore, the fate and transport of the most used ENP, SiO2, in porous media was studied. In addition, acute toxicity of As(III), As(V), In(III) and Ga(III) species was evaluated using different bioassays. Finally, the cytotoxicity of ENPs used in CMP slurries to human lung bronchial epithelial cells was evaluated using an impedance based real time cell analysis (RTCA) assay.
520 $a In Chapter 3, four model slurries containing ENPs including colloidal silica (c-SiO2), fumed silica (f-SiO2) cerium oxide (CeO2) and aluminum oxide (Al2O3) were characterized for their physical, chemical and toxicological properties. Ecotoxicity of these slurries to the marine bacterium, Aliivibrio fischeri, was evaluated by measuring its bioluminescence activity as a function of the ENP concentration dosed. In summary, the results indicate that these slurries are not likely to cause acute toxicity at environmentally relevant concentrations.
520 $a The potential risks from ENPs are dependent on their fate and transport in the environment. In Chapter 4, the transport and abatement of SiO2 NPs was studied through laboratory scale column experiments. Synthetic fluorescent core-shell SiO2 NPs were used to facilitate NP traceability. Three widely used filtering materials were used as porous media. Sand showed very poor capacity for the filtration of SiO2 NPs due to its limited surface area and high concentration of negative surface charge. In addition, the stability and transport of SiO2 NP was strongly dependent on the ionic strength of the solution. High ionic strength led to NP agglomeration and facilitated SiO2 NP retention, while low ionic strength resulted in release of captured NPs from the sand bed. Compared to sand, anthracite and GAC showed higher efficiency for SiO 2 NP capture. The superior capacity of GAC was primarily due to its porous structure and high surface area. A process model was developed to simulate NP capture in the packed bed columns and determine fundamental attraction parameters. This model provided an excellent fit to the experimental data. Taken together the results obtained indicate that GAC is an interesting material for SiO2 NPs filtration.
520 $a With the increasing usage of III-V materials, there are concerns about the ecological threats posed by III-V ions released during semiconductor manufacturing and from disposal of decommissioned electronic devices. In Chapter 5, the acute toxicity of As(III), As(V), In(III) and Ga(III) species was evaluated using different bioassays, including three microbial assays, testing for methanogenic activity, O2 uptake and bioluminescence inhibition of marine bacterium A. fischeri. Acute toxicity to the freshwater crustacean Daphnia magna was also tested. Overall, the results indicate that the ecotoxicity of In(III) and Ga(III) is much lower than that of the As species. This finding is important in filling the knowledge gap regarding the ecotoxicology of In and Ga.
520 $a Besides ecotoxicity, ENPs and III-V materials in CMP effluents could also pose a threat to human health. In Chapter 6, the cytotoxicity of CMP slurries to human bronchial epithelial cells (16HBE14o-) was assessed using a novel impedance based real time cell analyzer (RTCA). Cell death and detachment was observed in assays supplied with high concentrations of c-SiO 2 and f-SiO2 NPs (≥ 250 mg/L). On the other hand, CeO 2 and Al2O3 slurries were not inhibitory at concentrations up to 1250 mg/L. In addition, since CMP wastewater generated during the planarization of III-V films contains a mixture of ENPs and soluble III-V species, it is important to understand whether the interactions between these materials could alter their fate and toxicity. As(III) toxicity to human lung cells in the presence and absence of CeO2 NPs was evaluated using the RTCA assay. This work demonstrates that adsorption of As(III) on CeO2 NPs can lower As(III) concentration in the solution and reduce its bioavailability and subsequently result in As(III) detoxification.
520 $a In conclusion, this dissertation indicates that the ENPs (SiO2, CeO2 and Al2O3) used in semiconductor industry are not expected to cause acute toxicity to the natural environment and human health under environmentally relevant concentration (< 1 mg/L). Among the soluble III-V species, In(III) and Ga(III) showed no or mild acute inhibitory effects in different bioassays even at comparatively high concentration. However arsenic species are highly toxic to various important microbial populations in the environment and human cells. The results showed that arsenic could induce toxic effects under current discharge limit set for semiconductor industry. Finally, we demonstrated that the adsorption of As(III) on CeO2 NPs can lower the concentration of soluble As(III) and subsequently resulted in As(III) detoxification. (Abstract shortened by ProQuest.).
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