東華大學圖書館 |

語系: 繁體中文

說明(常見問題)

回圖書館首頁

手機版館藏查詢

登入

回首頁

切換: 標籤 | MARC模式 | ISBD

Tantalum and niobium-based capacitor...

Freeman, Yuri.

FindBook

Google Book

Amazon

博客來

Tantalum and niobium-based capacitors = science, technology, and applications /

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Tantalum and niobium-based capacitors/ by Yuri Freeman.
其他題名:	science, technology, and applications /
作者:	Freeman, Yuri.
出版者:	Cham :Springer International Publishing : : 2018.,
面頁冊數:	xix, 120 p. :ill., digital ;24 cm.
內容註:	Introduction -- Chap1: Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.
Contained By:	Springer eBooks
標題:	Capacitors. -
電子資源:	http://dx.doi.org/10.1007/978-3-319-67870-2
ISBN:	9783319678702

Tantalum and niobium-based capacitors = science, technology, and applications /
Freeman, Yuri.

Tantalum and niobium-based capacitorsscience, technology, and applications /[electronic resource] :by Yuri Freeman. - Cham :Springer International Publishing :2018. - xix, 120 p. :ill., digital ;24 cm.

Introduction -- Chap1: Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.

This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb) Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.

ISBN: 9783319678702

Standard No.: 10.1007/978-3-319-67870-2doiSubjects--Topical Terms:

651804
Capacitors.

LC Class. No.: TK7872.C65

Dewey Class. No.: 621.315

Tantalum and niobium-based capacitors = science, technology, and applications /
LDR:02573nmm a2200313 a 4500 001 2131698
003 DE-He213
005 20180620155050.0
006 m d
007 cr nn 008maaau
008 181005s2018 gw s 0 eng d
020 $a 9783319678702 $q (electronic bk.)
020 $a 9783319678696 $q (paper)
024 7 $a 10.1007/978-3-319-67870-2 $2 doi
035 $a 978-3-319-67870-2
040 $a GP $c GP
041 0 $a eng
050 4 $a TK7872.C65
072 7 $a TJFC $2 bicssc
072 7 $a TEC008010 $2 bisacsh
082 0 4 $a 621.315 $2 23
090 $a TK7872.C65 $b F855 2018
100 1 $a Freeman, Yuri. $3 3297518
245 1 0 $a Tantalum and niobium-based capacitors $h [electronic resource] : $b science, technology, and applications / $c by Yuri Freeman.
260 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2018.
300 $a xix, 120 p. : $b ill., digital ; $c 24 cm.
505 0 $a Introduction -- Chap1: Major Degradation Mechanisms -- Chap2: Basic Technology -- Chap3: Applications -- Conclusion.
520 $a This book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb) Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.
650 0 $a Capacitors. $3 651804
650 0 $a Capacitors $x Materials. $3 3297519
650 1 4 $a Engineering. $3 586835
650 2 4 $a Circuits and Systems. $3 896527
650 2 4 $a Electronic Circuits and Devices. $3 1245773
650 2 4 $a Electronics and Microelectronics, Instrumentation. $3 893838
710 2 $a SpringerLink (Online service) $3 836513
773 0 $t Springer eBooks
856 4 0 $u http://dx.doi.org/10.1007/978-3-319-67870-2
950 $a Engineering (Springer-11647)