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The use of photoactive precursors of...

Urankar, Edward Joseph.

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The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists./
作者:	Urankar, Edward Joseph.
出版者:	Ann Arbor : ProQuest Dissertations & Theses, : 1997,
面頁冊數:	137 p.
附註:	Source: Dissertation Abstracts International, Volume: 58-04, Section: B, page: 1906.
Contained By:	Dissertation Abstracts International58-04B.
標題:	Polymer chemistry. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9727885
ISBN:	9780591371987

The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists.
Urankar, Edward Joseph.

The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists. - Ann Arbor : ProQuest Dissertations & Theses, 1997 - 137 p.

Source: Dissertation Abstracts International, Volume: 58-04, Section: B, page: 1906.

Thesis (Ph.D.)--Cornell University, 1997.

The design and synthesis of novel polymer systems sensitive to the in situ generation of a basic species has been achieved. The development and testing of new chemically amplified imaging systems involving base-catalyzed processes were demonstrated with formulations of these polymeric materials containing photoactive precursors to amines. Both negative-tone and positive-tone imaging systems have been developed.

ISBN: 9780591371987Subjects--Topical Terms:

3173488
Polymer chemistry.

The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists.
LDR:03469nmm a2200337 4500 001 2128567
005 20180104132949.5
008 180830s1997 ||||||||||||||||| ||eng d
020 $a 9780591371987
035 $a (MiAaPQ)AAI9727885
035 $a AAI9727885
040 $a MiAaPQ $c MiAaPQ
100 1 $a Urankar, Edward Joseph. $3 3290737
245 1 4 $a The use of photoactive precursors of amines in the design of novel light-sensitive functional polymer systems and resists.
260 1 $a Ann Arbor : $b ProQuest Dissertations & Theses, $c 1997
300 $a 137 p.
500 $a Source: Dissertation Abstracts International, Volume: 58-04, Section: B, page: 1906.
500 $a Adviser: Jean M. J. Frechet.
502 $a Thesis (Ph.D.)--Cornell University, 1997.
520 $a The design and synthesis of novel polymer systems sensitive to the in situ generation of a basic species has been achieved. The development and testing of new chemically amplified imaging systems involving base-catalyzed processes were demonstrated with formulations of these polymeric materials containing photoactive precursors to amines. Both negative-tone and positive-tone imaging systems have been developed.
520 $a A series of methacrylate copolymers, containing either acetoacetate or cyanoacetate pendant groups can be photocrosslinked and imaged upon phototriggered formation of an amine catalyst within the polymer matrix. Addition of a bifunctional aldehyde molecule as crosslinker to the formulation provides an increase in resist sensitivity compared to the 2-component system. Monitoring of the resist films by UV-vis spectroscopy suggests that crosslinking in the presence of the bifunctional aldehyde molecule proceeds through a base catalyzed Knoevenagel reaction. Incorporation of the reactive cyanoacetate functionality into a phenolic polymer to provide aqueous base development to the negative-tone imaging system was also examined.
520 $a A second family of polymers susceptible to a base catalyzed $\beta$-elimination reaction has been developed. The functional polymers contain labile pendant carbonate units which have been activated to the $\beta$-elimination reaction with the incorporation of electron withdrawing groups to increase the acidity of the $\beta$-hydrogen. In the presence of photogenerated amines, these materials are converted to poly(4-hydroxystyrene), carbon dioxide, and an eliminated olefin. This modification process renders the exposed areas of the resist film soluble in aqueous base and provides the positive-tone relief image using this form of development. Conversion of the functional polymers to poly(4-hydroxystyrene) upon exposure and photogeneration of the amine catalyst can be confirmed using $\sp1$H-NMR and FTIR spectroscopy.
520 $a A novel negative-tone resist operating on the principle of base catalyzed decarboxylation of a carboxylic acid polymer has also been designed and tested. The resist system shows a high sensitivity to deep UV irradiation, ca. 10 mJ/cm$\sp2,$ while providing excellent image contrast. The versatility of this photogenerated amine catalyzed decarboxylation process was demonstrated by the ability of this resist to undergo dry development and reversal of the image tone.
590 $a School code: 0058.
650 4 $a Polymer chemistry. $3 3173488
650 4 $a Chemistry, Radiation. $3 1017804
650 4 $a Organic chemistry. $3 523952
690 $a 0495
690 $a 0754
690 $a 0490
710 2 $a Cornell University. $3 530586
773 0 $t Dissertation Abstracts International $g 58-04B.
790 $a 0058
791 $a Ph.D.
792 $a 1997
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9727885