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Growth of high permittivity dielectr...

Pampillon Arce, Maria Angela.

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Growth of high permittivity dielectrics by high pressure sputtering from metallic targets

Record Type:	Electronic resources : Monograph/item
Title/Author:	Growth of high permittivity dielectrics by high pressure sputtering from metallic targets/ by Maria Angela Pampillon Arce.
Author:	Pampillon Arce, Maria Angela.
Published:	Cham :Springer International Publishing : : 2017.,
Description:	xxiii, 164 p. :ill., digital ;24 cm.
[NT 15003449]:	Introduction -- Fabrication Techniques -- Characterization Techniques -- Thermal Oxidation of Gd2o3 -- Plasma Oxidation of Gd2o3 and Sc2o3 -- Gadolinium Scandate -- Interface Scavenging -- Gd2o3 on Inp Substrates -- Conclusions and Future Work.
Contained By:	Springer eBooks
Subject:	Metal oxide semiconductor field-effect transistors. -
Online resource:	http://dx.doi.org/10.1007/978-3-319-66607-5
ISBN:	9783319666075

Growth of high permittivity dielectrics by high pressure sputtering from metallic targets
Pampillon Arce, Maria Angela.

Growth of high permittivity dielectrics by high pressure sputtering from metallic targets[electronic resource] /by Maria Angela Pampillon Arce. - Cham :Springer International Publishing :2017. - xxiii, 164 p. :ill., digital ;24 cm. - Springer theses,2190-5053. - Springer theses..

Introduction -- Fabrication Techniques -- Characterization Techniques -- Thermal Oxidation of Gd2o3 -- Plasma Oxidation of Gd2o3 and Sc2o3 -- Gadolinium Scandate -- Interface Scavenging -- Gd2o3 on Inp Substrates -- Conclusions and Future Work.

This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means of high pressure sputtering from metallic targets using in situ plasma oxidation on Si and indium phosphate (InP) substrates. The advantage of this system is the high working pressure, which causes the particles to undergo multiple collisions and become thermalized before reaching the substrate in a pure diffusion process, thus protecting the semiconductor surface from damage. This work presents a unique fabrication using metallic targets and involving a two-step deposition process: a thin metallic film is sputtered in an Ar atmosphere and this film is then plasma oxidized in situ. It also demonstrates the fabrication of GdScO3 on Si with a permittivity value above 30 from metallic Gd and Sc targets. Since co-sputtering was not possible, a nanolaminate of these materials was deposited and annealed. The electrical properties of these devices show that the material is highly interesting from a microelectronic integration standpoint.

ISBN: 9783319666075

Standard No.: 10.1007/978-3-319-66607-5doiSubjects--Topical Terms:

553297
Metal oxide semiconductor field-effect transistors.

LC Class. No.: TK7871.99.M44

Dewey Class. No.: 621.3815284

Growth of high permittivity dielectrics by high pressure sputtering from metallic targets
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100 1 $a Pampillon Arce, Maria Angela. $3 3264892
245 1 0 $a Growth of high permittivity dielectrics by high pressure sputtering from metallic targets $h [electronic resource] / $c by Maria Angela Pampillon Arce.
260 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2017.
300 $a xxiii, 164 p. : $b ill., digital ; $c 24 cm.
490 1 $a Springer theses, $x 2190-5053
505 0 $a Introduction -- Fabrication Techniques -- Characterization Techniques -- Thermal Oxidation of Gd2o3 -- Plasma Oxidation of Gd2o3 and Sc2o3 -- Gadolinium Scandate -- Interface Scavenging -- Gd2o3 on Inp Substrates -- Conclusions and Future Work.
520 $a This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means of high pressure sputtering from metallic targets using in situ plasma oxidation on Si and indium phosphate (InP) substrates. The advantage of this system is the high working pressure, which causes the particles to undergo multiple collisions and become thermalized before reaching the substrate in a pure diffusion process, thus protecting the semiconductor surface from damage. This work presents a unique fabrication using metallic targets and involving a two-step deposition process: a thin metallic film is sputtered in an Ar atmosphere and this film is then plasma oxidized in situ. It also demonstrates the fabrication of GdScO3 on Si with a permittivity value above 30 from metallic Gd and Sc targets. Since co-sputtering was not possible, a nanolaminate of these materials was deposited and annealed. The electrical properties of these devices show that the material is highly interesting from a microelectronic integration standpoint.
650 0 $a Metal oxide semiconductor field-effect transistors. $3 553297
650 1 4 $a Physics. $3 516296
650 2 4 $a Surface and Interface Science, Thin Films. $3 1244633
650 2 4 $a Nanotechnology. $3 526235
650 2 4 $a Electronic Circuits and Devices. $3 1245773
650 2 4 $a Nanotechnology and Microengineering. $3 1005737
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950 $a Physics and Astronomy (Springer-11651)