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Free discontinuity problems
~
Fusco, Nicola.
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Free discontinuity problems
紀錄類型:
書目-電子資源 : Monograph/item
正題名/作者:
Free discontinuity problems/ edited by Nicola Fusco, Aldo Pratelli.
其他作者:
Fusco, Nicola.
出版者:
Pisa :Scuola Normale Superiore : : 2016.,
面頁冊數:
ix, 227 p. :ill., digital ;24 cm.
內容註:
Introduction -- Fine regularity results for Mumford-Shah minimizers: porosity, higher integrability and the Mumford-Shah conjecture -- Variational models for epitaxial growth -- Local and global minimality results for an isoperimetric problem with long-range interactions.
Contained By:
Springer eBooks
標題:
Discontinuous functions. -
電子資源:
http://dx.doi.org/10.1007/978-88-7642-593-6
ISBN:
9788876425936
Free discontinuity problems
Free discontinuity problems
[electronic resource] /edited by Nicola Fusco, Aldo Pratelli. - Pisa :Scuola Normale Superiore :2016. - ix, 227 p. :ill., digital ;24 cm. - Publications of the Scuola Normale Superiore ;19. - Publications of the Scuola Normale Superiore ;19..
Introduction -- Fine regularity results for Mumford-Shah minimizers: porosity, higher integrability and the Mumford-Shah conjecture -- Variational models for epitaxial growth -- Local and global minimality results for an isoperimetric problem with long-range interactions.
This book presents a series of lectures on three of the best known examples of free discontinuity problems: the Mumford-Shah model for image segmentation, a variational model for the epitaxial growth of thin films, and the sharp interface limit of the Ohta-Kawasaki model for pattern formation in dyblock copolymers.
ISBN: 9788876425936
Standard No.: 10.1007/978-88-7642-593-6doiSubjects--Topical Terms:
1001211
Discontinuous functions.
LC Class. No.: QA351
Dewey Class. No.: 515.9
Free discontinuity problems
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This book presents a series of lectures on three of the best known examples of free discontinuity problems: the Mumford-Shah model for image segmentation, a variational model for the epitaxial growth of thin films, and the sharp interface limit of the Ohta-Kawasaki model for pattern formation in dyblock copolymers.
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