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Development of a second generation s...

Ko, Cheng-Hao.

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Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source./
作者:	Ko, Cheng-Hao.
面頁冊數:	205 p.
附註:	Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.
Contained By:	Dissertation Abstracts International56-07B.
標題:	Optics. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9537799

Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
Ko, Cheng-Hao.

Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source. - 205 p.

Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.

Thesis (Ph.D.)--State University of New York at Stony Brook, 1995.

X-ray photoelectron spectroscopy (XPS) has been a major and powerful tool in performing chemical analysis on material surfaces. By focusing x-rays to form a microprobe, XPS can be extended to study heterogeneous surfaces in addition to homogeneous surfaces.Subjects--Topical Terms:

517925
Optics.

Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
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100 1 $a Ko, Cheng-Hao. $3 3188412
245 1 0 $a Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
300 $a 205 p.
500 $a Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.
500 $a Adviser: Janos Kirz.
502 $a Thesis (Ph.D.)--State University of New York at Stony Brook, 1995.
520 $a X-ray photoelectron spectroscopy (XPS) has been a major and powerful tool in performing chemical analysis on material surfaces. By focusing x-rays to form a microprobe, XPS can be extended to study heterogeneous surfaces in addition to homogeneous surfaces.
520 $a The second generation scanning photoelectron microscope at beam-line X1A of the National Synchrotron Light Source (NSLS), X1A SPEM-II, is designed for spatially resolved elemental and chemical analysis by XPS on material surfaces. Based on Fresnel zone plate microfocusing techniques with the use of a bright and coherent photon source (as is provided by the X1 undulator), this microscope is capable of acquiring XPS spectra from a small area irradiated by the focused beam and taking element-specific (using photopeaks) or chemical-state-specific images (by detecting the chemical core level shifts) with a spatial resolution defined by the focused spot size.
520 $a The X1A SPEM-II can focus photon energies between 300 to 800 eV with submicron spatial resolution and sub-eV energy resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer with multi-channel detection, which enables a technique called "Parallel Imaging for Chemical State Mapping" (PICSM). These two features make X1A SPEM-II a very unique XPS spectromicroscope.
520 $a With XPS spectromicroscopy at hand, material surface scientists are able to investigate a whole class of heterogeneous surfaces that are out-of-reach by electron microscopy due to the damaging nature and/or lack of chemical sensitivity of the electron probe.
590 $a School code: 0771.
650 4 $a Optics. $3 517925
650 4 $a Nuclear physics and radiation. $3 3173793
650 4 $a Condensed matter physics. $3 3173567
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690 $a 0756
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710 2 $a State University of New York at Stony Brook. $3 1019194
773 0 $t Dissertation Abstracts International $g 56-07B.
790 $a 0771
791 $a Ph.D.
792 $a 1995
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9537799