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Development of a second generation s...
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Ko, Cheng-Hao.
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Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
Record Type:
Electronic resources : Monograph/item
Title/Author:
Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source./
Author:
Ko, Cheng-Hao.
Description:
205 p.
Notes:
Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.
Contained By:
Dissertation Abstracts International56-07B.
Subject:
Optics. -
Online resource:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9537799
Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
Ko, Cheng-Hao.
Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
- 205 p.
Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.
Thesis (Ph.D.)--State University of New York at Stony Brook, 1995.
X-ray photoelectron spectroscopy (XPS) has been a major and powerful tool in performing chemical analysis on material surfaces. By focusing x-rays to form a microprobe, XPS can be extended to study heterogeneous surfaces in addition to homogeneous surfaces.Subjects--Topical Terms:
517925
Optics.
Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
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Development of a second generation scanning photoemission microscope at the National Synchrotron Light Source.
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205 p.
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Source: Dissertation Abstracts International, Volume: 56-07, Section: B, page: 3825.
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Adviser: Janos Kirz.
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Thesis (Ph.D.)--State University of New York at Stony Brook, 1995.
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X-ray photoelectron spectroscopy (XPS) has been a major and powerful tool in performing chemical analysis on material surfaces. By focusing x-rays to form a microprobe, XPS can be extended to study heterogeneous surfaces in addition to homogeneous surfaces.
520
$a
The second generation scanning photoelectron microscope at beam-line X1A of the National Synchrotron Light Source (NSLS), X1A SPEM-II, is designed for spatially resolved elemental and chemical analysis by XPS on material surfaces. Based on Fresnel zone plate microfocusing techniques with the use of a bright and coherent photon source (as is provided by the X1 undulator), this microscope is capable of acquiring XPS spectra from a small area irradiated by the focused beam and taking element-specific (using photopeaks) or chemical-state-specific images (by detecting the chemical core level shifts) with a spatial resolution defined by the focused spot size.
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The X1A SPEM-II can focus photon energies between 300 to 800 eV with submicron spatial resolution and sub-eV energy resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer with multi-channel detection, which enables a technique called "Parallel Imaging for Chemical State Mapping" (PICSM). These two features make X1A SPEM-II a very unique XPS spectromicroscope.
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With XPS spectromicroscopy at hand, material surface scientists are able to investigate a whole class of heterogeneous surfaces that are out-of-reach by electron microscopy due to the damaging nature and/or lack of chemical sensitivity of the electron probe.
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School code: 0771.
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http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9537799
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