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Laser interference lithography for l...

Wathuthanthri, Ishan.

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Laser interference lithography for large area patterning and the fabrication of functional nanostructures.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Laser interference lithography for large area patterning and the fabrication of functional nanostructures./
作者:	Wathuthanthri, Ishan.
面頁冊數:	129 p.
附註:	Source: Dissertation Abstracts International, Volume: 76-12(E), Section: B.
Contained By:	Dissertation Abstracts International76-12B(E).
標題:	Nanotechnology. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3715973
ISBN:	9781321943153

Laser interference lithography for large area patterning and the fabrication of functional nanostructures.
Wathuthanthri, Ishan.

Laser interference lithography for large area patterning and the fabrication of functional nanostructures. - 129 p.

Source: Dissertation Abstracts International, Volume: 76-12(E), Section: B.

Thesis (Ph.D.)--Stevens Institute of Technology, 2015.

Nature-inspired phenomena such as the "moth eye" and "lotus leaf" effects have gained a lot of interest in recent years due to potential applications in a wide range of scientific and engineering disciplines. To practically achieve a majority of these biomimetic applications it is necessary to fabricate such nano-featured surfaces in a low-cost and high-throughput manner. To this end, this dissertation focuses on developing and using the Interference Lithography (IL) technologies to achieve large-area nanopatterning. IL is a parallel-type nanolithography technique that shares many of the advantages of other parallel-type techniques such as deep-UV photolithography while alleviating a majority of concerns such as cost and complexity. IL relies on the interference of two or more beams of light where the resulting interference fringes are generally recorded on a light sensitive polymeric material such as photoresist. In simple two-beam IL systems, the periodicity of the interference fringes is simply a function of wavelength and the angle of separation of the two beams, while the maximum coverage area is a constrained by the optical path and the exposed area. To this extent, in the design of interferometers for nanopatterning, the challenge remains in designing systems where a simple mechanism exists for varying the angle of separation of the interfering beams and in turn periodicity of the interference fringes while also enabling large-area exposures. To this end, the first half of this dissertation demonstrates three different IL systems (Lloyd-mirror, two-degree-of freedom Lloyd-mirror, and the tunable two-mirror systems) designed and established at Stevens capable of fast tuning of periodicities while also achieving wafer-scale (4") large-area nanopatterning. Using the large-area nanopatterns of photoresist, various pattern transfer techniques have also been investigated where the photoresist film is used as a template layer to transfer the large-area periodic nano-features onto different types of substrates using both additive and subtractive processes, resulting in the fabrication of functionalized nanostructures over a large substrate area. Finally, nanostructures are designed and fabricated to use the moth eye effect resulting in highly anti-reflective surfaces. These surfaces are then applied in SERS sensing as well as a mechanical anti-reflective layer for lithography process providing a highly robust mechanical anti-reflective layer with a much higher performance compared to traditional thin film anti-reflective coatings.

ISBN: 9781321943153Subjects--Topical Terms:

526235
Nanotechnology.

Laser interference lithography for large area patterning and the fabrication of functional nanostructures.
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