The source/drain engineering of nano...
Li, Zhiqiang.

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  • The source/drain engineering of nanoscale Germanium-based MOS devices
  • Record Type: Electronic resources : Monograph/item
    Title/Author: The source/drain engineering of nanoscale Germanium-based MOS devices/ by Zhiqiang Li.
    Author: Li, Zhiqiang.
    Published: Berlin, Heidelberg :Springer Berlin Heidelberg : : 2016.,
    Description: xiv, 59 p. :ill., digital ;24 cm.
    [NT 15003449]: Introduction -- Ge-based Schottky barrier height modulation technology -- Metal germanide technology -- Contact resistance of Ge-based devices -- Conclusions.
    Contained By: Springer eBooks
    Subject: Metal oxide semiconductor field-effect transistors. -
    Online resource: http://dx.doi.org/10.1007/978-3-662-49683-1
    ISBN: 9783662496831
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W9278952 電子資源 11.線上閱覽_V 電子書 EB TK7871.95 .L693 2016 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
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