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The source/drain engineering of nano...
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Li, Zhiqiang.
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The source/drain engineering of nanoscale Germanium-based MOS devices
Record Type:
Electronic resources : Monograph/item
Title/Author:
The source/drain engineering of nanoscale Germanium-based MOS devices/ by Zhiqiang Li.
Author:
Li, Zhiqiang.
Published:
Berlin, Heidelberg :Springer Berlin Heidelberg : : 2016.,
Description:
xiv, 59 p. :ill., digital ;24 cm.
[NT 15003449]:
Introduction -- Ge-based Schottky barrier height modulation technology -- Metal germanide technology -- Contact resistance of Ge-based devices -- Conclusions.
Contained By:
Springer eBooks
Subject:
Metal oxide semiconductor field-effect transistors. -
Online resource:
http://dx.doi.org/10.1007/978-3-662-49683-1
ISBN:
9783662496831
The source/drain engineering of nanoscale Germanium-based MOS devices
Li, Zhiqiang.
The source/drain engineering of nanoscale Germanium-based MOS devices
[electronic resource] /by Zhiqiang Li. - Berlin, Heidelberg :Springer Berlin Heidelberg :2016. - xiv, 59 p. :ill., digital ;24 cm. - Springer theses,2190-5053. - Springer theses..
Introduction -- Ge-based Schottky barrier height modulation technology -- Metal germanide technology -- Contact resistance of Ge-based devices -- Conclusions.
ISBN: 9783662496831
Standard No.: 10.1007/978-3-662-49683-1doiSubjects--Topical Terms:
553297
Metal oxide semiconductor field-effect transistors.
LC Class. No.: TK7871.95
Dewey Class. No.: 621.38152
The source/drain engineering of nanoscale Germanium-based MOS devices
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Introduction -- Ge-based Schottky barrier height modulation technology -- Metal germanide technology -- Contact resistance of Ge-based devices -- Conclusions.
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Physics and Astronomy (Springer-11651)
based on 0 review(s)
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ALL
電子資源
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Volume Number:
Items
1 records • Pages 1 •
1
Inventory Number
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Material type
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Usage Class
Loan Status
No. of reservations
Opac note
Attachments
W9278952
電子資源
11.線上閱覽_V
電子書
EB TK7871.95 .L693 2016
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1 records • Pages 1 •
1
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