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Design for manufacturability with ad...

Yu, Bei.

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Design for manufacturability with advanced lithography

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Design for manufacturability with advanced lithography/ by Bei Yu, David Z. Pan.
作者:	Yu, Bei.
其他作者:	Pan, David Z.
出版者:	Cham :Springer International Publishing : : 2016.,
面頁冊數:	xi, 164 p. :ill., digital ;24 cm.
內容註:	Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
Contained By:	Springer eBooks
標題:	Integrated circuits - Design and construction. -
電子資源:	http://dx.doi.org/10.1007/978-3-319-20385-0
ISBN:	9783319203850$q(electronic bk.)

Design for manufacturability with advanced lithography
Yu, Bei.

Design for manufacturability with advanced lithography[electronic resource] /by Bei Yu, David Z. Pan. - Cham :Springer International Publishing :2016. - xi, 164 p. :ill., digital ;24 cm.

Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

ISBN: 9783319203850$q(electronic bk.)

Standard No.: 10.1007/978-3-319-20385-0doiSubjects--Topical Terms:

658490
Integrated circuits
--Design and construction.

LC Class. No.: TK7874

Dewey Class. No.: 621.3815

Design for manufacturability with advanced lithography
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505 0 $a Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
520 $a This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
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