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Elemental and compound semiconductor...

Porter, Lon Alan, Jr.

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Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies.

Record Type:	Electronic resources : Monograph/item
Title/Author:	Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies./
Author:	Porter, Lon Alan, Jr.
Description:	304 p.
Notes:	Source: Dissertation Abstracts International, Volume: 64-11, Section: B, page: 5519.
Contained By:	Dissertation Abstracts International64-11B.
Subject:	Chemistry, Inorganic. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3113861

Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies.
Porter, Lon Alan, Jr.

Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies. - 304 p.

Source: Dissertation Abstracts International, Volume: 64-11, Section: B, page: 5519.

Thesis (Ph.D.)--Purdue University, 2003.

The fundamental understanding of silicon surface chemistry is an essential tool for silicon's continued dominance of the semiconductor industry in the years to come. By tapping into the vast library of organic functionalities, the synthesis of organic monolayers may be utilized to prepare interfaces, tailored to a myriad of applications ranging from silicon VLSI device optimization and MEMS to physiological implants and chemical sensors. Efforts in our lab to form stable organic monolayers on porous silicon through direct silicon-carbon linkages have resulted in several efficient functionalization methods. In the first chapter of this thesis a comprehensive review of these methods, and many others is presented. The following chapter and the appendix serve to demonstrate both potential applications and studies aimed at developing a fundamental understanding of the chemistry behind the organic functionalization of silicon surfaces.Subjects--Topical Terms:

517253
Chemistry, Inorganic.

Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies.
LDR:02814nmm 2200289 4500 001 1865353
005 20041217071848.5
008 130614s2003 eng d
035 $a (UnM)AAI3113861
035 $a AAI3113861
040 $a UnM $c UnM
100 1 $a Porter, Lon Alan, Jr. $3 1952804
245 1 0 $a Elemental and compound semiconductor surface chemistry: Intelligent interfacial design facilitated through novel functionalization and deposition strategies.
300 $a 304 p.
500 $a Source: Dissertation Abstracts International, Volume: 64-11, Section: B, page: 5519.
500 $a Major Professor: Jillian M. Buriak.
502 $a Thesis (Ph.D.)--Purdue University, 2003.
520 $a The fundamental understanding of silicon surface chemistry is an essential tool for silicon's continued dominance of the semiconductor industry in the years to come. By tapping into the vast library of organic functionalities, the synthesis of organic monolayers may be utilized to prepare interfaces, tailored to a myriad of applications ranging from silicon VLSI device optimization and MEMS to physiological implants and chemical sensors. Efforts in our lab to form stable organic monolayers on porous silicon through direct silicon-carbon linkages have resulted in several efficient functionalization methods. In the first chapter of this thesis a comprehensive review of these methods, and many others is presented. The following chapter and the appendix serve to demonstrate both potential applications and studies aimed at developing a fundamental understanding of the chemistry behind the organic functionalization of silicon surfaces.
520 $a The remainder of this thesis attempts to demonstrate new methods of metal deposition onto both elemental and compound semiconductor surfaces. Currently, there is considerable interest in producing patterned metallic structures with reduced dimensions for use in technologies such as ULSI device fabrication, MEMS, and arrayed nanosensors, without sacrificing throughput or cost effectiveness. Research in our laboratory has focused on the preparation of precious metal thin films on semiconductor substrates via electroless deposition. Continuous metallic films form spontaneously under ambient conditions, in the absence of a fluoride source or an externally applied current. In order to apply this metallization method toward the development of useful technologies, patterning utilizing photolithography, microcontact printing, and scanning probe nanolithography has been demonstrated.
590 $a School code: 0183.
650 4 $a Chemistry, Inorganic. $3 517253
650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Engineering, Electronics and Electrical. $3 626636
690 $a 0488
690 $a 0794
690 $a 0544
710 2 0 $a Purdue University. $3 1017663
773 0 $t Dissertation Abstracts International $g 64-11B.
790 1 0 $a Buriak, Jillian M., $e advisor
790 $a 0183
791 $a Ph.D.
792 $a 2003
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3113861