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Phase, microstructure, and chemistry...
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Daniels, Matthew John.
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Phase, microstructure, and chemistry of aluminum copper iron chromium and aluminum copper iron quasicrystalline wear coatings produced via physical vapor deposition.
Record Type:
Electronic resources : Monograph/item
Title/Author:
Phase, microstructure, and chemistry of aluminum copper iron chromium and aluminum copper iron quasicrystalline wear coatings produced via physical vapor deposition./
Author:
Daniels, Matthew John.
Description:
184 p.
Notes:
Source: Dissertation Abstracts International, Volume: 64-06, Section: B, page: 2863.
Contained By:
Dissertation Abstracts International64-06B.
Subject:
Engineering, Materials Science. -
Online resource:
http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3096077
Phase, microstructure, and chemistry of aluminum copper iron chromium and aluminum copper iron quasicrystalline wear coatings produced via physical vapor deposition.
Daniels, Matthew John.
Phase, microstructure, and chemistry of aluminum copper iron chromium and aluminum copper iron quasicrystalline wear coatings produced via physical vapor deposition.
- 184 p.
Source: Dissertation Abstracts International, Volume: 64-06, Section: B, page: 2863.
Thesis (Ph.D.)--University of Michigan, 2003.
A new method for producing complex AlCuFe and AlCuFeCr quasicrystalline and quasicrystalline approximant coatings using powder metallurgy targets was developed for use in DC and RF sputter systems. Microstructure analysis performed on the targets showed many of the constituents remained in their elemental form in the target. Small amounts of aluminum-rich intermetallics bonded the targets into semiporous blocks. "As-deposited" coatings exhibited broad x-ray diffraction maxima. The deposition window for the quasicrystalline phase was large, and included a variety of sputter gas pressures and target powers. Grain size modeling and radial distribution function analysis of the as-deposited coatings showed intermediate order and simulated grain sizes of ≈2.5 nm. Annealing at 450°C and above was required to develop the quasicrystalline or approximant structure. Depth dependent techniques such as cross section TEM, sputter profile XPS, and depth profiling with a synchrotron x-ray source were used to elucidate these changes to develop a model for microstructure development during annealing. In the AlCuFeCr system, crystalline aluminum and an amorphous phase related to the quasicrystal formed in the top 110 nm of the film. Residual porosity of 10% was observed in the annealed coating, concentrated predominantly in columnar pores. Grain growth proceeded along columnar and layered porosity in the film. In the AlCuFe system, anneals of varying lengths showed the route for microstructure development for the as-deposited film. The R-phase (icosohedral approximant) partially developed after 1 hour of annealing at 450°C. An aluminum-deficient beta phase was also observed in the near surface region due to preferential aluminum oxidation and enrichment at the surface of the film. The mechanical behavior of these quasicrystalline coatings was also investigated during annealing using a Laue radiography/topography imaging system capable of monitoring stress evolution in situ. The result is a clear picture of the complete processing window necessary to produce high-quality, robust AlCuFe and AlCuFeCr quasicrystalline wear coatings.Subjects--Topical Terms:
1017759
Engineering, Materials Science.
Phase, microstructure, and chemistry of aluminum copper iron chromium and aluminum copper iron quasicrystalline wear coatings produced via physical vapor deposition.
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A new method for producing complex AlCuFe and AlCuFeCr quasicrystalline and quasicrystalline approximant coatings using powder metallurgy targets was developed for use in DC and RF sputter systems. Microstructure analysis performed on the targets showed many of the constituents remained in their elemental form in the target. Small amounts of aluminum-rich intermetallics bonded the targets into semiporous blocks. "As-deposited" coatings exhibited broad x-ray diffraction maxima. The deposition window for the quasicrystalline phase was large, and included a variety of sputter gas pressures and target powers. Grain size modeling and radial distribution function analysis of the as-deposited coatings showed intermediate order and simulated grain sizes of ≈2.5 nm. Annealing at 450°C and above was required to develop the quasicrystalline or approximant structure. Depth dependent techniques such as cross section TEM, sputter profile XPS, and depth profiling with a synchrotron x-ray source were used to elucidate these changes to develop a model for microstructure development during annealing. In the AlCuFeCr system, crystalline aluminum and an amorphous phase related to the quasicrystal formed in the top 110 nm of the film. Residual porosity of 10% was observed in the annealed coating, concentrated predominantly in columnar pores. Grain growth proceeded along columnar and layered porosity in the film. In the AlCuFe system, anneals of varying lengths showed the route for microstructure development for the as-deposited film. The R-phase (icosohedral approximant) partially developed after 1 hour of annealing at 450°C. An aluminum-deficient beta phase was also observed in the near surface region due to preferential aluminum oxidation and enrichment at the surface of the film. The mechanical behavior of these quasicrystalline coatings was also investigated during annealing using a Laue radiography/topography imaging system capable of monitoring stress evolution in situ. The result is a clear picture of the complete processing window necessary to produce high-quality, robust AlCuFe and AlCuFeCr quasicrystalline wear coatings.
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http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3096077
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