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Plasma etching for advanced polymer ...

Bitting, Donald S.

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Plasma etching for advanced polymer optical devices.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Plasma etching for advanced polymer optical devices./
作者:	Bitting, Donald S.
面頁冊數:	138 p.
附註:	Source: Dissertation Abstracts International, Volume: 64-12, Section: B, page: 6273.
Contained By:	Dissertation Abstracts International64-12B.
標題:	Engineering, Materials Science. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3117297

Plasma etching for advanced polymer optical devices.
Bitting, Donald S.

Plasma etching for advanced polymer optical devices. - 138 p.

Source: Dissertation Abstracts International, Volume: 64-12, Section: B, page: 6273.

Thesis (Ph.D.)--University of Florida, 2003.

Plasma etching is a common microfabrication technique which can be applied to polymers as well as glasses, metals, and semiconductors. The fabrication of low loss and reliable polymer optical devices commonly makes use of advanced microfabrication processing techniques similar in nature to those utilized in standard semiconductor fabrication technology. Among these techniques, plasma/reactive ion etching is commonly used in the formation of waveguiding core structures. Plasma etching is a powerful processing technique with many potential applications in the emerging field of polymer optical device fabrication. One such promising application explored in this study is in the area of thin film-substrate adhesion enhancement.Subjects--Topical Terms:

1017759
Engineering, Materials Science.

Plasma etching for advanced polymer optical devices.
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500 $a Source: Dissertation Abstracts International, Volume: 64-12, Section: B, page: 6273.
500 $a Chair: Stephen Pearton.
502 $a Thesis (Ph.D.)--University of Florida, 2003.
520 $a Plasma etching is a common microfabrication technique which can be applied to polymers as well as glasses, metals, and semiconductors. The fabrication of low loss and reliable polymer optical devices commonly makes use of advanced microfabrication processing techniques similar in nature to those utilized in standard semiconductor fabrication technology. Among these techniques, plasma/reactive ion etching is commonly used in the formation of waveguiding core structures. Plasma etching is a powerful processing technique with many potential applications in the emerging field of polymer optical device fabrication. One such promising application explored in this study is in the area of thin film-substrate adhesion enhancement.
520 $a Two approaches involving plasma processing were evaluated to improve substrate-thin film adhesion in the production of polymer waveguide optical devices. Plasma treatment of polymer substrates such as polycarbonate has been studied to promote the adhesion of fluoropolymer thin film coatings for waveguide device fabrication. The effects of blanket oxygen plasma etchback on substrate, microstructural substrate feature formation, and the long term performance and reliability of these methods were investigated.
520 $a Use of a blanket oxygen plasma to alter the polycarbonate surface prior to fluoropolymer casting was found to have positive but limited capability to improve the adhesive strength between these polymers. Experiments show a strong correlation between surface roughness and adhesion strength.
520 $a The formation of small scale surface features using microlithography and plasma etching on the polycarbonate surface proved to provide outstanding adhesion strength when compared to any other known treatment methods.
520 $a Long term environmental performance testing of these surface treatment methods provided validating data. Test results showed these process approaches to be effective solutions to the problem of adhesion between hydrocarbon based polymer substrates and fluoropolymer thin films.
590 $a School code: 0070.
650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Chemistry, Polymer. $3 1018428
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710 2 0 $a University of Florida. $3 718949
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792 $a 2003
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