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Optical low coherence reflectometry ...

Shelley, Paul H. Jr.

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Optical low coherence reflectometry for process analysis.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Optical low coherence reflectometry for process analysis./
作者:	Shelley, Paul H. Jr.
面頁冊數:	205 p.
附註:	Source: Dissertation Abstracts International, Volume: 57-12, Section: B, page: 7497.
Contained By:	Dissertation Abstracts International57-12B.
標題:	Chemistry, Analytical. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=9716920
ISBN:	0591248611

Optical low coherence reflectometry for process analysis.
Shelley, Paul H. Jr.

Optical low coherence reflectometry for process analysis. - 205 p.

Source: Dissertation Abstracts International, Volume: 57-12, Section: B, page: 7497.

Thesis (Ph.D.)--University of Washington, 1996.

This work begins with a presentation of the theory of optical low coherence reflectometry (OLCR) including a summary of previous research in this field. Characterization of an OLCR instrument and its use in the measurement of single layer polymer films is addressed. In addition, the use of OLCR for measurements of process applications of transparent materials including: biological film thickness measurement, layer thickness in multiple layer films, and clear coat layer thickness, is discussed. Considerations of light scattering theory are explored with an emphasis on the phenomenon of enhanced backscattering especially with respect to three different model scattering systems. The final area of research describes two process applications of OLCR measurement for light scattering materials with a focus on particle size analysis in attrition milling processes.

ISBN: 0591248611Subjects--Topical Terms:

586156
Chemistry, Analytical.

Optical low coherence reflectometry for process analysis.
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500 $a Chairperson: Bruce R. Kowalski.
502 $a Thesis (Ph.D.)--University of Washington, 1996.
520 $a This work begins with a presentation of the theory of optical low coherence reflectometry (OLCR) including a summary of previous research in this field. Characterization of an OLCR instrument and its use in the measurement of single layer polymer films is addressed. In addition, the use of OLCR for measurements of process applications of transparent materials including: biological film thickness measurement, layer thickness in multiple layer films, and clear coat layer thickness, is discussed. Considerations of light scattering theory are explored with an emphasis on the phenomenon of enhanced backscattering especially with respect to three different model scattering systems. The final area of research describes two process applications of OLCR measurement for light scattering materials with a focus on particle size analysis in attrition milling processes.
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650 4 $a Engineering, Materials Science. $3 1017759
650 4 $a Physics, Optics. $3 1018756
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