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Methods of preparing, imaging and pr...

Beckley, Scott A.

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Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine).

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine)./
作者:	Beckley, Scott A.
面頁冊數:	63 p.
附註:	Source: Masters Abstracts International, Volume: 44-04, page: 1857.
Contained By:	Masters Abstracts International44-04.
標題:	Chemistry, Radiation. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=1431570
ISBN:	9780542509292

Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine).
Beckley, Scott A.

Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine). - 63 p.

Source: Masters Abstracts International, Volume: 44-04, page: 1857.

Thesis (M.S.)--University of Northern Colorado, 2005.

This study explored an area of photolithography involved in on-press developable (switchable) plate formation for the graphic arts industry. Historically, the process for forming a lithographic plate required a dissolution step in an alkaline and/or other chemical developer. In view of global environmental protection and green chemistry initiatives, the disposal of the developer waste has been a matter of industrial concern. Thus, there are increased demands for improvements to either wet processing or even no processing. The research discussed in this study is intended to develop a method for direct formulation of a photoresist using a light sensitive organic polymer with switchable composition having the capability to change its nature from hydrophilic to hydrophobic property upon radiation.

ISBN: 9780542509292Subjects--Topical Terms:

1017804
Chemistry, Radiation.

Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine).
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245 1 0 $a Methods of preparing, imaging and printing thermally switchable resist containing poly(betaine).
300 $a 63 p.
500 $a Source: Masters Abstracts International, Volume: 44-04, page: 1857.
500 $a Adviser: James O. Schreck.
502 $a Thesis (M.S.)--University of Northern Colorado, 2005.
520 $a This study explored an area of photolithography involved in on-press developable (switchable) plate formation for the graphic arts industry. Historically, the process for forming a lithographic plate required a dissolution step in an alkaline and/or other chemical developer. In view of global environmental protection and green chemistry initiatives, the disposal of the developer waste has been a matter of industrial concern. Thus, there are increased demands for improvements to either wet processing or even no processing. The research discussed in this study is intended to develop a method for direct formulation of a photoresist using a light sensitive organic polymer with switchable composition having the capability to change its nature from hydrophilic to hydrophobic property upon radiation.
520 $a The photoresist is coated thinly onto a substrate (aluminum) to produce a hydrophilic surface. The polarity change of a negative working photoresist is observed on-press (reproduction to paper) with radiated areas having ink receptive properties (hydrophobic) and non-imaged areas having water accepting properties (hydrophilic). (Abstract shortened by UMI.)
590 $a School code: 0161.
650 4 $a Chemistry, Radiation. $3 1017804
650 4 $a Chemistry, Polymer. $3 1018428
650 4 $a Chemistry, Organic. $3 516206
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