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Development of nanoimprint lithograp...

Cheng, Xing.

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Development of nanoimprint lithography and its applications in device fabrication.

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Development of nanoimprint lithography and its applications in device fabrication./
作者:	Cheng, Xing.
面頁冊數:	145 p.
附註:	Source: Dissertation Abstracts International, Volume: 66-02, Section: B, page: 1066.
Contained By:	Dissertation Abstracts International66-02B.
標題:	Engineering, Electronics and Electrical. -
電子資源:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3163771
ISBN:	9780496980482

Development of nanoimprint lithography and its applications in device fabrication.
Cheng, Xing.

Development of nanoimprint lithography and its applications in device fabrication. - 145 p.

Source: Dissertation Abstracts International, Volume: 66-02, Section: B, page: 1066.

Thesis (Ph.D.)--University of Michigan, 2005.

Nanoimprint Lithography (NIL) technique has attracted widespread interest in both academic research and industrial development since its invention in 1995. It is capable of replicating sub-10 nm features and has high throughput, and it only requires very simple equipment setup. This dissertation is focused on the further advancing of the NIL technology and its applications in micro- and nano-scale device fabrications.

ISBN: 9780496980482Subjects--Topical Terms:

626636
Engineering, Electronics and Electrical.

Development of nanoimprint lithography and its applications in device fabrication.
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245 1 0 $a Development of nanoimprint lithography and its applications in device fabrication.
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500 $a Source: Dissertation Abstracts International, Volume: 66-02, Section: B, page: 1066.
500 $a Chair: Lingjie Jay Guo.
502 $a Thesis (Ph.D.)--University of Michigan, 2005.
520 $a Nanoimprint Lithography (NIL) technique has attracted widespread interest in both academic research and industrial development since its invention in 1995. It is capable of replicating sub-10 nm features and has high throughput, and it only requires very simple equipment setup. This dissertation is focused on the further advancing of the NIL technology and its applications in micro- and nano-scale device fabrications.
520 $a The first main task of this dissertation is to review the limitations in conventional NIL and to investigate possible routes to overcome these limitations. Several innovations have been achieved. First, a new UV-curable liquid resist based on cationic polymerization of silicone epoxies is developed for room temperature and low pressure NIL. Second, a Hybrid-Mask-Mold method is invented for removing the residual layer in conventional NIL, and a Combined-Nanoimprint-and-Photolithography technique is developed for patterning large and nano-scale structures in one step. Lastly, a reversal imprinting over topography technique is described for patterning non-flat substrate and building up complex three-dimensional polymer structures.
520 $a The second main task of this dissertation is to apply the imprinting technique to the fabrications of nanofluidic and organic opto-electronic devices. Sub-100 nm cross-sectional dimension nanofluidic channels have been achieved by a modified NIL technique. Nearly 100% stretching of DNA molecules in such nano-channels were demonstrated. NIL was also employed in fabricating pixel arrays in passive polymers, which served as templates for high-resolution organic light-emitting diode array fabrication. Pixels as small as 2 microns are successfully light up.
590 $a School code: 0127.
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