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Electron Beam Lithography throughput...

Ruan, Junru.

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Electron Beam Lithography throughput and resolution enhancement with innovative blanker design.

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Electron Beam Lithography throughput and resolution enhancement with innovative blanker design./
Author:	Ruan, Junru.
Description:	279 p.
Notes:	Source: Dissertation Abstracts International, Volume: 71-10, Section: B, page: 6245.
Contained By:	Dissertation Abstracts International71-10B.
Subject:	Engineering, General. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3422427
ISBN:	9781124215808

Electron Beam Lithography throughput and resolution enhancement with innovative blanker design.
Ruan, Junru.

Electron Beam Lithography throughput and resolution enhancement with innovative blanker design. - 279 p.

Source: Dissertation Abstracts International, Volume: 71-10, Section: B, page: 6245.

Thesis (Ph.D.)--State University of New York at Albany, 2010.

Electron Beam Lithography (EBL) is one of the most important and most widely used methods for nano-fabrication. The primary advantage of electron beam lithography is its high resolution, and its ability to expose nanometer features without a mask. On the other hand, one of the key limitations of electron beam lithography is throughput. Slow blanking speed is one of the major bottlenecks for the system speed. In this dissertation, I will first review the prior literature of high speed blanking. Thorough theoretical and experimental studies are done on the existing designs. Physical models are built and analytical ray tracing is performed. Based on the analytical studies, a large scale numerical simulation is programmed to simulate and predict blanker performance. Carefully designed experiments are performed on CNSE VB300 system to characterize the existing blanker unit. The experimental results show great consistency with the theoretical and simulation predictions. Based on these results, an innovative blanker design, quadruple-deflection blanker, is proposed. It is shown in analytical and simulation studies that the new design eliminates beam motion error, and it is capable of supporting high quality high speed electron beam lithography. A thorough review on throughput issue of electron beam lithography is presented to estimate the impact of the new blanker design. Finally, mechanical and electronic design of a new blanker unit is discussed in great detail.

ISBN: 9781124215808Subjects--Topical Terms:

1020744
Engineering, General.

Electron Beam Lithography throughput and resolution enhancement with innovative blanker design.
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005 20110527105444.5
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020 $a 9781124215808
035 $a (UMI)AAI3422427
035 $a AAI3422427
040 $a UMI $c UMI
100 1 $a Ruan, Junru. $3 1674750
245 1 0 $a Electron Beam Lithography throughput and resolution enhancement with innovative blanker design.
300 $a 279 p.
500 $a Source: Dissertation Abstracts International, Volume: 71-10, Section: B, page: 6245.
500 $a Adviser: John G. Hartley.
502 $a Thesis (Ph.D.)--State University of New York at Albany, 2010.
520 $a Electron Beam Lithography (EBL) is one of the most important and most widely used methods for nano-fabrication. The primary advantage of electron beam lithography is its high resolution, and its ability to expose nanometer features without a mask. On the other hand, one of the key limitations of electron beam lithography is throughput. Slow blanking speed is one of the major bottlenecks for the system speed. In this dissertation, I will first review the prior literature of high speed blanking. Thorough theoretical and experimental studies are done on the existing designs. Physical models are built and analytical ray tracing is performed. Based on the analytical studies, a large scale numerical simulation is programmed to simulate and predict blanker performance. Carefully designed experiments are performed on CNSE VB300 system to characterize the existing blanker unit. The experimental results show great consistency with the theoretical and simulation predictions. Based on these results, an innovative blanker design, quadruple-deflection blanker, is proposed. It is shown in analytical and simulation studies that the new design eliminates beam motion error, and it is capable of supporting high quality high speed electron beam lithography. A thorough review on throughput issue of electron beam lithography is presented to estimate the impact of the new blanker design. Finally, mechanical and electronic design of a new blanker unit is discussed in great detail.
590 $a School code: 0668.
650 4 $a Engineering, General. $3 1020744
650 4 $a Engineering, Electronics and Electrical. $3 626636
650 4 $a Physics, Optics. $3 1018756
690 $a 0537
690 $a 0544
690 $a 0752
710 2 $a State University of New York at Albany. $b Nanoscale Science and Engineering-Nanoscale Engineering. $3 1674751
773 0 $t Dissertation Abstracts International $g 71-10B.
790 1 0 $a Hartley, John G., $e advisor
790 1 0 $a Lifshin, Eric $e committee member
790 1 0 $a Grove, Timothy R. $e committee member
790 1 0 $a Denbeaux, Gregory P. $e committee member
790 1 0 $a Crosland, Nigel $e committee member
790 $a 0668
791 $a Ph.D.
792 $a 2010
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3422427