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Advances in CMP/polishing technologi...

Doi, Toshiro.

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Advances in CMP/polishing technologies for the manufacture of electronic devices

紀錄類型:	書目-電子資源 : Monograph/item
正題名/作者:	Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.{me_controlnum}
其他作者:	Doi, Toshiro.
出版者:	Oxford :William Andrew, : 2012.,
面頁冊數:	1 online resource (xii, 317 p.)
附註:	Includes index.
標題:	Electrolytic polishing. -
電子資源:	http://www.sciencedirect.com/science/book/9781437778595
ISBN:	9781437778595

Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.{me_controlnum} - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)

Includes index.

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.

ISBN: 9781437778595Subjects--Topical Terms:

1613774
Electrolytic polishing.
Index Terms--Genre/Form:

542853
Electronic books.

LC Class. No.: TS670 / .A386 2012eb

Dewey Class. No.: 671.7/2

Advances in CMP/polishing technologies for the manufacture of electronic devices
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