Gildea, Adam James.
概要
| 作品: | 1 作品在 0 項出版品 0 種語言 | |
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書目資訊
Plasma-Enhanced Atomic Layer Deposition of Ruthenium-Titanium Nitride Mixed-Phase Layers for Direct-Plate Liner and Copper Diffusion Barrier Applications.
by:
Gildea, Adam James.; State University of New York at Albany., Nanoscale Science and Engineering-Nanoscale Engineering.
(書目-語言資料,印刷品)