Gildea, Adam James.
Overview
| Works: | 1 works in 0 publications in 0 languages | |
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Titles
Plasma-Enhanced Atomic Layer Deposition of Ruthenium-Titanium Nitride Mixed-Phase Layers for Direct-Plate Liner and Copper Diffusion Barrier Applications.
by:
Gildea, Adam James.; State University of New York at Albany., Nanoscale Science and Engineering-Nanoscale Engineering.
(Language materials, printed)