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Physical design and mask synthesis f...

Shim, Seongbo.

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Physical design and mask synthesis for directed self-assembly lithography

Record Type:	Electronic resources : Monograph/item
Title/Author:	Physical design and mask synthesis for directed self-assembly lithography/ by Seongbo Shim, Youngsoo Shin.
Author:	Shim, Seongbo.
other author:	Shin, Youngsoo.
Published:	Cham :Springer International Publishing : : 2018.,
Description:	xiv, 138 p. :ill. (some col.), digital ;24 cm.
[NT 15003449]:	Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.
Contained By:	Springer eBooks
Subject:	Integrated circuits - Design and construction. -
Online resource:	http://dx.doi.org/10.1007/978-3-319-76294-4
ISBN:	9783319762944

Physical design and mask synthesis for directed self-assembly lithography
Shim, Seongbo.

Physical design and mask synthesis for directed self-assembly lithography[electronic resource] /by Seongbo Shim, Youngsoo Shin. - Cham :Springer International Publishing :2018. - xiv, 138 p. :ill. (some col.), digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

ISBN: 9783319762944

Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:

658490
Integrated circuits
--Design and construction.

LC Class. No.: TK7874 / .S556 2018

Dewey Class. No.: 621.3815

Physical design and mask synthesis for directed self-assembly lithography
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100 1 $a Shim, Seongbo. $3 3307945
245 1 0 $a Physical design and mask synthesis for directed self-assembly lithography $h [electronic resource] / $c by Seongbo Shim, Youngsoo Shin.
260 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2018.
300 $a xiv, 138 p. : $b ill. (some col.), digital ; $c 24 cm.
490 1 $a NanoScience and technology, $x 1434-4904
505 0 $a Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.
520 $a This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
650 0 $a Integrated circuits $x Design and construction. $3 658490
650 0 $a Integrated circuits $x Masks. $3 912252
650 0 $a Self-assembly (Chemistry) $3 605741
650 0 $a Lithography. $3 763743
650 1 4 $a Materials Science. $3 890867
650 2 4 $a Nanotechnology. $3 526235
650 2 4 $a Nanotechnology and Microengineering. $3 1005737
650 2 4 $a Circuits and Systems. $3 896527
650 2 4 $a Optical and Electronic Materials. $3 891120
650 2 4 $a Nanoscale Science and Technology. $3 1244861
650 2 4 $a Semiconductors. $3 516162
700 1 $a Shin, Youngsoo. $3 3135639
710 2 $a SpringerLink (Online service) $3 836513
773 0 $t Springer eBooks
830 0 $a NanoScience and technology. $3 1567468
856 4 0 $u http://dx.doi.org/10.1007/978-3-319-76294-4
950 $a Chemistry and Materials Science (Springer-11644)