Barela, Marcos J.
概要
| 作品: | 1 作品在 0 項出版品 0 種語言 | |
|---|---|---|
書目資訊
The characterization of octafluorocyclobutane-based plasma discharges for the selective etching and processing of silicon dioxide and low-K dielectric thin films.
by:
Barela, Marcos J.; The University of New Mexico.
(書目-電子資源)