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Handbook of chemical vapor depostion...

Pierson, Hugh O.{me_controlnum}

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Handbook of chemical vapor depostion [i.e. deposition] (CVD) = principles, technology, and applications /

Record Type:	Electronic resources : Monograph/item
Title/Author:	Handbook of chemical vapor depostion [i.e. deposition] (CVD)/ by Hugh O. Pierson.
Reminder of title:	principles, technology, and applications /
remainder title:	Handbook of chemical vapor deposition
Author:	Pierson, Hugh O.{me_controlnum}
other author:	Pierson, Hugh O.
Published:	Norwich, N.Y. :Noyes Publications/William Andrew Pub., : c1999.,
Description:	1 online resource (xxiv, 482 p.) :ill.
Notes:	Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992.
[NT 15003449]:	Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index.
Subject:	Chemical vapor deposition - Handbooks, manuals, etc. -
Online resource:	http://www.sciencedirect.com/science/book/9780815514329
ISBN:	9780815514329

Handbook of chemical vapor depostion [i.e. deposition] (CVD) = principles, technology, and applications /
Pierson, Hugh O.{me_controlnum}

Handbook of chemical vapor depostion [i.e. deposition] (CVD)principles, technology, and applications /[electronic resource] :Handbook of chemical vapor depositionby Hugh O. Pierson. - 2nd ed. - Norwich, N.Y. :Noyes Publications/William Andrew Pub.,c1999. - 1 online resource (xxiv, 482 p.) :ill. - Materials science and process technology series. - Materials science and process technology series..

Rev. ed. of: Handbook of chemical vapor deposition (CVD), c1992.

Includes bibliographical references and index.

Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index.

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

ISBN: 9780815514329

Source: 153777:153937Elsevier Science & Technologyhttp://www.sciencedirect.comSubjects--Topical Terms:

1613519
Chemical vapor deposition
--Handbooks, manuals, etc.Index Terms--Genre/Form:

542853
Electronic books.

LC Class. No.: TS695 / .P52 1999eb

Dewey Class. No.: 671.7/35

Handbook of chemical vapor depostion [i.e. deposition] (CVD) = principles, technology, and applications /
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246 1 8 $a Handbook of chemical vapor deposition
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260 $a Norwich, N.Y. : $b Noyes Publications/William Andrew Pub., $c c1999.
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504 $a Includes bibliographical references and index.
505 0 $a Introduction and General Considerations -- Fundamentals of Chemical Vapor Deposition -- The Chemistry of CVD -- Metallo-Organic CVD (MOCVD) -- CVD Processes and Equipment -- The CVD of Metals -- The CVD of the Allotropes of Carbon -- The CVD of Non-Metallic Elements -- The CVD of Ceramic Materials: Carbides -- The CVD of Ceramic Materials: Nitrides -- The CVD of Ceramic Materials: Oxides -- The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) -- CVD in Electronic Applications: Semiconductors -- CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers -- CVD in Optoelectronic and Ferroelectric Applications -- CVD in Optical Applications -- CVD in Wear- and Corrosion-Resistant Applications -- CVD in Cutting-Tool Applications -- CVD in Fiber, Powder, and Monolithic Applications -- Conversion Guide -- Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification -- Index.
520 $a Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
588 $a Description based on print version record.
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776 0 8 $i Print version: $a Pierson, Hugh O. $t Handbook of chemical vapor depostion [i.e. deposition] (CVD). $b 2nd ed. $d Norwich, N.Y. : Noyes Publications/William Andrew Pub., c1999 $z 0815514328 $z 9780815514329 $w (DLC) 99026065 $w (OCoLC)41090758
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